Laser & Optoelectronics Progress, Volume. 61, Issue 15, 1508001(2024)
Research on Uniformity of Illumination Field Intensity in Fourier Synthesis Illumination
Fig. 1. Schematic diagram of Fourier synthesis illumination and uniformization device
Fig. 2. Simulation model of scanning and uniform trace of Fourier synthesis illumination
Fig. 3. Beam profile and intensity curve in the illuminated field. (a) (e) MEMS mirror for uniformity is not rotated; (b) (f) ±0.5°vibration; (c) (g) ±1.0°vibration; (d) (h) ±2.0°vibration
Fig. 4. Influence of illumination field uniformiry on Fourier synthesis illumination modes. (a) Disk; (b) annular; (c) dipole; (d) quadrupole
Fig. 5. Fourier synthesis illumination and uniformization experimental setup. (a) Photograph of setup; (b) no off-axis illumination; (c) quadrupole illumination; (d) quadrupole illumination and uniformity
Fig. 6. Relationship between uniformity of illumination field and rotation amplitude of MEMS mirror
Fig. 7. Relationship between uniformity of illumination field and rotation frequency of MEMS mirror
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Hui Li, Yueyang Ma, Haoyu Yin, Xiaoquan Han, Yufeng Huang, Xiaobin Wu. Research on Uniformity of Illumination Field Intensity in Fourier Synthesis Illumination[J]. Laser & Optoelectronics Progress, 2024, 61(15): 1508001
Category: Geometric Optics
Received: Jul. 7, 2023
Accepted: Jul. 24, 2023
Published Online: Aug. 12, 2024
The Author Email: Xiaobin Wu (wuxiaobin@ime.ac.cn)
CSTR:32186.14.LOP231676