Laser & Optoelectronics Progress, Volume. 61, Issue 15, 1508001(2024)

Research on Uniformity of Illumination Field Intensity in Fourier Synthesis Illumination

Hui Li1,2, Yueyang Ma1,2, Haoyu Yin1,2, Xiaoquan Han1,2, Yufeng Huang1,2, and Xiaobin Wu1,2、*
Author Affiliations
  • 1R & D Center of Optoelectronic Technology, Institute of Microelectronics of the Chinese Academy of Sciences, Beijing 100029, China
  • 2University of Chinese Academy of Sciences, Beijing 100049, China
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    Figures & Tables(7)
    Schematic diagram of Fourier synthesis illumination and uniformization device
    Simulation model of scanning and uniform trace of Fourier synthesis illumination
    Beam profile and intensity curve in the illuminated field. (a) (e) MEMS mirror for uniformity is not rotated; (b) (f) ±0.5°vibration; (c) (g) ±1.0°vibration; (d) (h) ±2.0°vibration
    Influence of illumination field uniformiry on Fourier synthesis illumination modes. (a) Disk; (b) annular; (c) dipole; (d) quadrupole
    Fourier synthesis illumination and uniformization experimental setup. (a) Photograph of setup; (b) no off-axis illumination; (c) quadrupole illumination; (d) quadrupole illumination and uniformity
    Relationship between uniformity of illumination field and rotation amplitude of MEMS mirror
    Relationship between uniformity of illumination field and rotation frequency of MEMS mirror
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    Hui Li, Yueyang Ma, Haoyu Yin, Xiaoquan Han, Yufeng Huang, Xiaobin Wu. Research on Uniformity of Illumination Field Intensity in Fourier Synthesis Illumination[J]. Laser & Optoelectronics Progress, 2024, 61(15): 1508001

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    Paper Information

    Category: Geometric Optics

    Received: Jul. 7, 2023

    Accepted: Jul. 24, 2023

    Published Online: Aug. 12, 2024

    The Author Email: Xiaobin Wu (wuxiaobin@ime.ac.cn)

    DOI:10.3788/LOP231676

    CSTR:32186.14.LOP231676

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