Deep Etching Process of GaAs-Based Micro-Nano Grating Based on Multilayer Resist

Jingjing Yang; Jie Fan; Xiaohui Ma; Yonggang Zou; Qiqi Wang

doi:10.3788/CJL202249.0313002

Chinese Journal of Lasers, Volume. 49, Issue 3, 0313002(2022)

Deep Etching Process of GaAs-Based Micro-Nano Grating Based on Multilayer Resist

Jingjing Yang, Jie Fan^*, Xiaohui Ma^**, Yonggang Zou, and Qiqi Wang

State Key Laboratory of High Power Semiconductor Laser, Changchun University of Science and Technology, Changchun, Jilin 130022, China

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Jingjing Yang, Jie Fan, Xiaohui Ma, Yonggang Zou, Qiqi Wang. Deep Etching Process of GaAs-Based Micro-Nano Grating Based on Multilayer Resist[J]. Chinese Journal of Lasers, 2022, 49(3): 0313002

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Paper Information

Category: micro and nano optics

Received: Apr. 27, 2021

Accepted: Jun. 15, 2021

Published Online: Jan. 18, 2022

The Author Email: Fan Jie (fanjie@cust.edu.cn), Ma Xiaohui (mxh@cust.edu.cn)

DOI:10.3788/CJL202249.0313002

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology