Journal of Infrared and Millimeter Waves, Volume. 42, Issue 5, 634(2023)

Study of Zinc-diffused InGaAs/InP planar infrared detector processed with rapid thermal annealing

Jia-Sheng CAO1,2,3, Tao LI1,2、*, Yi-Zhen YU1,2, Chun-Lei YU1,2, Bo YANG1,2, Ying-Jie MA1,2, Xiu-Mei SHAO1,2, Xue LI1,2, and Hai-Mei GONG1,2、**
Author Affiliations
  • 1State Key Laboratories of Transducer Technology,Shanghai Institute of Technical Physics,Chinese Academy of Sciences,Shanghai 200083,China
  • 2Key Laboratory of Infrared Imaging Materials and Detectors,Chinese Academy of Sciences,Shanghai 200083,China
  • 3Graduate School of the Chinese Academy of Sciences,Beijing 100039,China
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    Figures & Tables(14)
    Cross-section diagram of the PIN planar type photodiode
    The optical microscopy image of Φ1 mm detector
    Net acceptor concentration profiles measured by ECV
    Zn concentration profiles measured by SIMS
    PL spectrum of samples with different probe laser wavelengths:(a)only 532 nm probe;(b)only 1064 nm probe
    Measured Cd-V curves of the unannealed PD and annealed PD
    The Cd-3-V curves and corresponding linear fitting curves of the unannealed PD and annealed PD
    Measured dark currents for Φ1 mm detectors with different annealing time raging form 260K to 300K:(a)260K;(b)270K;(c)280K;(d)290K;(e)300K
    The dark current density as a function of 1000/T at different reverse-bias voltage for Φ1 mm detectors of different annealing time:(a)annealing 0 min;(b)annealing 10 minTable 3 The thermal activation energy Ea of the unannealed PD and the annealed PD
    Dark current measured at 300K and fitted for Φ1 mm detectors of different annealing time:(a)annealing 0 min;(b)annealing 10 min
    The detectivity spectrum of detectors at 300K
    • Table 1. The PIN epitaxy materials for detectors

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      Table 1. The PIN epitaxy materials for detectors

      Epitaxy layerLayer thickness/μmDoping concentration/cm-3
      n-InP capping layer15×1016
      i-In0.53Ga0.47As absorption layer2.52×1014
      n+-InP buffer layer0.5>2×1018
      InP substrate350>4×1018
    • Table 2. Conditions of diffusion and annealing process for detectors

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      Table 2. Conditions of diffusion and annealing process for detectors

      Sample NumberABCD
      Diffusion temperature/℃530530530530
      Diffusion time/min10101010
      Annealing temperature/℃450450450450
      Annealing time/min03710
    • Table 3. [in Chinese]

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      Table 3. [in Chinese]

      unannealed PDannealed PD
      Ea(eV)@-0.5V0.6370.587
      Ea(eV)@-0.4V0.6530.610
      Ea(eV)@-0.3V0.6710.616
      Ea(eV)@-0.2V0.6920.639
      Ea(eV)@-0.1V0.7150.680
      Ea(eV)@-0.01V0.7180.687
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    Jia-Sheng CAO, Tao LI, Yi-Zhen YU, Chun-Lei YU, Bo YANG, Ying-Jie MA, Xiu-Mei SHAO, Xue LI, Hai-Mei GONG. Study of Zinc-diffused InGaAs/InP planar infrared detector processed with rapid thermal annealing[J]. Journal of Infrared and Millimeter Waves, 2023, 42(5): 634

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    Paper Information

    Category: Research Articles

    Received: Dec. 15, 2022

    Accepted: --

    Published Online: Aug. 30, 2023

    The Author Email: Tao LI (litao@mail.sitp.ac.cn), Hai-Mei GONG (hmgong@mail.sitp.ac.cn)

    DOI:10.11972/j.issn.1001-9014.2023.05.008

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