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Chinese Journal of Lasers, Volume. 45, Issue 1, 103002(2018)

Development of a Novel Optical Variable Attenuator in Lithography Exposure System

Li Meixuan1,2、*, Wang Li1, and Dong Lianhe1
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  • 1[in Chinese]
  • 2[in Chinese]
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    Article index updated: Mar. 10, 2025

    The article is cited by 6 article(s) CLP online library. (Some content might be in Chinese.)
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    Li Meixuan, Wang Li, Dong Lianhe. Development of a Novel Optical Variable Attenuator in Lithography Exposure System[J]. Chinese Journal of Lasers, 2018, 45(1): 103002

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    Paper Information

    Category: materials and thin films

    Received: Jul. 18, 2017

    Accepted: --

    Published Online: Jan. 24, 2018

    The Author Email: Meixuan Li (limeixuannuc@163.com)

    DOI:10.3788/CJL201845.0103002

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology