Chinese Optics Letters, Volume. 23, Issue 6, 063602(2025)

Optical performances of near-infrared metalenses with process-induced defects

Xiaofei Liu1, Ruohui Chen1, Yilin Lu1, Chenxu Zhu2, Yang Qiu1, Xingyan Zhao1, Shaonan Zheng1, Qize Zhong1, Bo Cui2, Yuan Dong1,3、*, and Ting Hu1
Author Affiliations
  • 1School of Microelectronics, Shanghai University, Shanghai 201800, China
  • 2Department of Electrical and Computer Engineering, University of Waterloo, Waterloo N2L 3G1, Canada
  • 3Shanghai Collaborative Innovation Center of Intelligent Sensing Chip Technology, Shanghai University, Shanghai 201800, China
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    Figures & Tables(6)
    (a) Transmission and phase as a function of d for the ideal nanopillars at λ = 940 nm. The inset shows the schematic of a unit cell. (b)–(e) Schematics of different types of defects. (f) and (g) The tilted-view SEM images of the reference metalens without designed defects.
    Experimental setup used to capture the focal plane images.
    Measured results of metalenses with CD bias. (a) Normalized focal plane intensity profiles. (b) The optical microscopy image of the metalens with Δd = 30 nm. (c) The SEM image of pillars with d = 250 nm. (d) Normalized intensity cross-sections of the focal spots. (e) Simulated and measured focusing efficiencies. (f) MTF and (g) Strehl ratio curves with various Δd.
    Measured results of metalenses with random missing pillars. (a) Normalized focal plane intensity profiles. (b) The optical microscopy image of the metalens with ms = 40%. (c) Normalized intensity cross-sections of the focal spots. (d) Simulated and measured focusing efficiencies. (e) MTF and (f) Strehl ratio curves with various ms.
    Measured results of metalenses with a void disk. (a) Normalized focal plane intensity profiles. (b) The optical microscopy image of the metalens with a void disk with D = 30 µm and ΔL = 50 µm. The inset shows the SEM image of the void disk. (c) and (d) Normalized intensity cross-sections of the focal spots with a void disk of D = 30 and D = 60 µm, respectively. (e) Simulated and measured focusing efficiencies. (f) MTF and (g) Strehl ratio curves with various D and ΔL.
    Measured results of metalenses with a solid disk. (a) Normalized focal plane intensity profiles. (b) The optical microscopy image of the metalens with a solid disk with D = 30 µm and ΔL = 50 µm. The inset shows the SEM image of the solid disk. (c) and (d) Normalized intensity cross-sections of the focal spots with a solid disk of D = 30 and 60 µm, respectively. (e) Simulated and measured focusing efficiencies. (f) MTF and (g) Strehl ratio curves with various D and ΔL.
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    Xiaofei Liu, Ruohui Chen, Yilin Lu, Chenxu Zhu, Yang Qiu, Xingyan Zhao, Shaonan Zheng, Qize Zhong, Bo Cui, Yuan Dong, Ting Hu, "Optical performances of near-infrared metalenses with process-induced defects," Chin. Opt. Lett. 23, 063602 (2025)

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    Paper Information

    Category: Nanophotonics, Metamaterials, and Plasmonics

    Received: Jul. 31, 2024

    Accepted: Jan. 13, 2025

    Posted: Jan. 13, 2025

    Published Online: May. 27, 2025

    The Author Email: Yuan Dong (dongyuan@shu.edu.cn)

    DOI:10.3788/COL202523.063602

    CSTR:32184.14.COL202523.063602

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