Researching | Laser‑Induced Discharge Plasma Extreme Ultraviolet Source

Chinese Journal of Lasers, Volume. 51, Issue 7, 0701012(2024)

Laser‑Induced Discharge Plasma Extreme Ultraviolet Source

Junwu Wang¹, Hongwen Xuan^1,3、*, Xinbing Wang², and Vassily S. Zakharov⁴

Author Affiliations

¹GBA Branch of Aerospace Information Research Institute, Chinese Academy of Sciences, Guangzhou 510530, Guangdong, China

²Wuhan National Laboratory for Optoelectronics, Wuhan 430074, Hubei, China

³University of Chinese Academy of Sciences, Beijing 100049, China

⁴Kurchatov Institute,National Research Center, Moscow 125047, Russia

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Junwu Wang, Hongwen Xuan, Xinbing Wang, Vassily S. Zakharov. Laser‑Induced Discharge Plasma Extreme Ultraviolet Source[J]. Chinese Journal of Lasers, 2024, 51(7): 0701012

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Paper Information

Category: laser devices and laser physics

Received: Dec. 7, 2023

Accepted: Jan. 16, 2024

Published Online: Apr. 11, 2024

The Author Email: Xuan Hongwen (xuanhw@aircas.ac.cn)

DOI:10.3788/CJL231488

CSTR:32183.14.CJL231488

Topics

laser devices and laser physics

Lasers and Laser Optics

laser manufacturing

Instrumentation, Measurement and Metrology