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Journal of Synthetic Crystals, Volume. 51, Issue 7, 1300(2022)

Advances in Chemical Vapor Deposition Equipment Used for SiC Epitaxy

HAN Yuebin1,2、*, PU Yong1,2, and SHI Jianxin1,2
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    HAN Yuebin, PU Yong, SHI Jianxin. Advances in Chemical Vapor Deposition Equipment Used for SiC Epitaxy[J]. Journal of Synthetic Crystals, 2022, 51(7): 1300

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    Received: Apr. 7, 2022

    Accepted: --

    Published Online: Aug. 12, 2022

    The Author Email: Yuebin HAN (hanshan@sicentury.com)

    DOI:

    CSTR:32186.14.

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology