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Chinese Optics Letters, Volume. 14, Issue 8, 081203(2016)

Interference-aided spectrum-fitting method for accurate film thickness determination

Xingxing Liu1,2,3, Shaowei Wang1,2、*, Hui Xia1, Xutao Zhang1,3, Ruonan Ji1,2,3, Tianxin Li1,2, and Wei Lu1,2
Author Affiliations
  • 1National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China
  • 2Shanghai Engineering Research Center of Energy-Saving Coatings, Shanghai 200083, China
  • 3University of Chinese Academy of Sciences, Beijing 100049, China
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    Cited By

    [1] Xu Chen, Mingfei Wu, Xingxing Liu, Ding Wang, Feng Liu, Yuwei Chen, Fei Yi, Wanxia Huang, Shaowei Wang. Tuning the Doping Ratio and Phase Transition Temperature of VO2 Thin Film by Dual-Target Co-Sputtering. Nanomaterials, 9, 834(2019).

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    Xingxing Liu, Shaowei Wang, Hui Xia, Xutao Zhang, Ruonan Ji, Tianxin Li, Wei Lu, "Interference-aided spectrum-fitting method for accurate film thickness determination," Chin. Opt. Lett. 14, 081203 (2016)

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    Paper Information

    Category: Instrumentation, measurement, and metrology

    Received: Mar. 31, 2016

    Accepted: Jun. 14, 2016

    Published Online: Aug. 3, 2018

    The Author Email: Shaowei Wang (wangshw@mail.sitp.ac.cn)

    DOI:10.3788/COL201614.081203

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology