Interference-aided spectrum-fitting method for accurate film thickness determination

Xingxing Liu; Shaowei Wang; Hui Xia; Xutao Zhang; Ruonan Ji; Tianxin Li; Wei Lu

doi:10.3788/COL201614.081203

Chinese Optics Letters, Volume. 14, Issue 8, 081203(2016)

Interference-aided spectrum-fitting method for accurate film thickness determination

Xingxing Liu^1,2,3, Shaowei Wang^1,2、*, Hui Xia¹, Xutao Zhang^1,3, Ruonan Ji^1,2,3, Tianxin Li^1,2, and Wei Lu^1,2

¹National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China

²Shanghai Engineering Research Center of Energy-Saving Coatings, Shanghai 200083, China

³University of Chinese Academy of Sciences, Beijing 100049, China

show less

Cited By

Article index updated: Mar. 17, 2025

Citation counts are provided from Web of Science. The counts may vary by service, and are reliant on the availability of their data.

The article is cited by 10 article(s) from Web of Science.

The article is cited by 1 article(s) CLP online library. (Some content might be in Chinese.)

Tools

Get Citation

Copy Citation Text

Xingxing Liu, Shaowei Wang, Hui Xia, Xutao Zhang, Ruonan Ji, Tianxin Li, Wei Lu, "Interference-aided spectrum-fitting method for accurate film thickness determination," Chin. Opt. Lett. 14, 081203 (2016)

Download Citation

EndNote(RIS)BibTex Plain Text

Set citation alerts for article

Save article for my favorites

Paper Information

Category: Instrumentation, measurement, and metrology

Received: Mar. 31, 2016

Accepted: Jun. 14, 2016

Published Online: Aug. 3, 2018

The Author Email: Shaowei Wang (wangshw@mail.sitp.ac.cn)

DOI:10.3788/COL201614.081203

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology