Chinese Journal of Lasers, Volume. 47, Issue 4, 401001(2020)
Selective Etching Technologies for GaAs/AlGaAs in Vertical-Cavity Surface-Emitting Lasers
Fig. 2. SEM pictures of different etching solutions. (a) 1∶1∶7; (b) 1∶1∶10; (c) 1∶1∶13
Fig. 4. SEM pictures under different RF powers. (a) 60 W; (b) 80 W; (c) 100 W; (d) 110W
Fig. 6. SEM pictures under different BCl3 flow rates. (a) 3 sccm; (b) 5 sccm; (c) 7 sccm
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Zhang Qiubo, Feng Yuan, Li Hui, Yan Changling, Hao Yongqin. Selective Etching Technologies for GaAs/AlGaAs in Vertical-Cavity Surface-Emitting Lasers[J]. Chinese Journal of Lasers, 2020, 47(4): 401001
Category: laser devices and laser physics
Received: Oct. 18, 2019
Accepted: --
Published Online: Apr. 8, 2020
The Author Email: Yongqin Hao (hyq72081220@aliyun.com)