Selective Etching Technologies for GaAs/AlGaAs in Vertical-Cavity Surface-Emitting Lasers

Zhang Qiubo; Feng Yuan; Li Hui; Yan Changling; Hao Yongqin

doi:10.3788/CJL202047.0401001

Chinese Journal of Lasers, Volume. 47, Issue 4, 401001(2020)

Selective Etching Technologies for GaAs/AlGaAs in Vertical-Cavity Surface-Emitting Lasers

Zhang Qiubo, Feng Yuan, Li Hui, Yan Changling, and Hao Yongqin^*

National Key Laboratory of Science and Technology on High Power Semiconductor Lasers,Changchun University of Science and Technology, Changchun, Jilin 130022, China

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Zhang Qiubo, Feng Yuan, Li Hui, Yan Changling, Hao Yongqin. Selective Etching Technologies for GaAs/AlGaAs in Vertical-Cavity Surface-Emitting Lasers[J]. Chinese Journal of Lasers, 2020, 47(4): 401001

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Paper Information

Category: laser devices and laser physics

Received: Oct. 18, 2019

Accepted: --

Published Online: Apr. 8, 2020

The Author Email: Yongqin Hao (hyq72081220@aliyun.com)

DOI:10.3788/CJL202047.0401001

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology