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Chinese Optics Letters, Volume. 17, Issue 12, 121102(2019)

Adaptive gradient-based source and mask co-optimization with process awareness

Yijiang Shen1、*, Fei Peng1, Xiaoyan Huang1, and Zhenrong Zhang2
Author Affiliations
  • 1School of Automation, Guangdong University of Technology, Mega Education Center South, Guangzhou 510006, China
  • 2Guangxi Key Laboratory of Multimedia Communications and Network Technology, School of Computer, Electronics and Information, Guangxi University, Nanning 530004, China
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    Cited By

    [1] Lufeng Liao, Sikun Li, Xiangzhao Wang, Libin Zhang, Pengzheng Gao, Yayi Wei, Weijie Shi. Critical pattern selection method for full-chip source and mask optimization. Optics Express, 28, 20748(2020).

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    Yijiang Shen, Fei Peng, Xiaoyan Huang, Zhenrong Zhang, "Adaptive gradient-based source and mask co-optimization with process awareness," Chin. Opt. Lett. 17, 121102 (2019)

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    Paper Information

    Category: Imaging Systems

    Received: Apr. 24, 2019

    Accepted: Aug. 6, 2019

    Published Online: Dec. 3, 2019

    The Author Email: Yijiang Shen (yjshen@gdut.edu.cn)

    DOI:10.3788/COL201917.121102

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology