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Chinese Journal of Lasers, Volume. 40, Issue 9, 908001(2013)

Far-Field Multi-Parameter Measurement of Diffractive Optical Element for Pupil Shaping in Lithography System

Hu Zhonghua1,2、*, Zhu Jing1, Yang Baoxi1,2, Pen Xuefeng1, Zeng Aijun1,2, and Huang Huijie1,2
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    References(7)

    [1] [1] Hu Zhonghua, Yang Baoxi, Zhu Jing, et al.. Pupil shaping techniques in high resolution projection exposure tools[J]. Laser & Optoelectronics Progress, 2011, 48(11): 111101.

    [2] [2] Wang Jun, Jin Chunshui, Wang Liping, et al.. Study on the off-axis illumination for extreme ultraviolet lithography[J]. Acta Optica Sinica, 2012, 32(12): 1211003.

    [3] [3] Xing Shasha, Wu Rengmao, Li Haifeng, et al.. Freeform-surface design of off-axis illumination in projection lithography[J]. Acta Optica Sinica, 2011, 31(3): 0322002.

    [4] [4] Zhang Wei, Gong Yan. Vector analysis of diffractive optical elements for off-axis illumination of projection lithographic system[J]. Acta Optica Sinica, 2011, 31(10): 1005002.

    [5] [5] Zhang Wei, Gong Yan. Design of diffractive optical elements for off-axis illumination in projection lithography［J］. Optics and Precision Engineering, 2008, 16(11): 2081-2086.

    [6] [6] John E Childers, Tom Baker, Marc D Himel, et al.. Advanced testing requirements of diffractive optical elements for off-axis illumination in photolithography[C]. SPIE, 2009, 7430: 74300S.

    [7] [7] Marc D Himel, Robert E Hutchins, Jamey C Colvin. Design and fabrication of customized illumination patterns for low-k1 lithography: a diffractive approach[C]. SPIE, 2001, 4346: 1436-1442.

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    Hu Zhonghua, Zhu Jing, Yang Baoxi, Pen Xuefeng, Zeng Aijun, Huang Huijie. Far-Field Multi-Parameter Measurement of Diffractive Optical Element for Pupil Shaping in Lithography System[J]. Chinese Journal of Lasers, 2013, 40(9): 908001

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    Paper Information

    Category: measurement and metrology

    Received: Mar. 28, 2013

    Accepted: --

    Published Online: Aug. 12, 2013

    The Author Email: Zhonghua Hu (huzhonghua@siom.ac.cn)

    DOI:10.3788/cjl201340.0908001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology