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Chinese Journal of Lasers, Volume. 26, Issue 11, 987(1999)

Determining the Residual Nonlinear Error of a Dual-Frequency Interferometer for Nanometrology

[in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]2, and [in Chinese]2
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  • 1[in Chinese]
  • 2[in Chinese]
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    [1] [1] Wenmei Hou, Guenter Wilkening. Investigation and compensation of the nonlinearity of heterodyne interferometers. Precision Engineering, 1992,14(2):91～98

    [2] [2] Wenmei Hou, Xianbin Zhao. Drift of nonlinearity in the heterodyne interferometer. Precision Engineering, 1994,16(1): 25～35

    [3] [3] A. E. Rosenbluth, N. Bobroff. Optical sources of nonlinearity in heterodyne interferometers. Precision Engineering, 1990, 12 (1):7～11

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    [3] Le Yanfen, Ju Aisong. Analysis and Measurement of the Nonlinear Errors in Heterodyne Interferometers[J]. Laser & Optoelectronics Progress, 2016, 53(5): 51203

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Determining the Residual Nonlinear Error of a Dual-Frequency Interferometer for Nanometrology[J]. Chinese Journal of Lasers, 1999, 26(11): 987

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    Paper Information

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    Received: Jun. 8, 1998

    Accepted: --

    Published Online: Aug. 9, 2006

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    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology