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Chinese Journal of Lasers, Volume. 26, Issue 11, 987(1999)

Determining the Residual Nonlinear Error of a Dual-Frequency Interferometer for Nanometrology

[in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]2, and [in Chinese]2
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Determining the Residual Nonlinear Error of a Dual-Frequency Interferometer for Nanometrology[J]. Chinese Journal of Lasers, 1999, 26(11): 987

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    Received: Jun. 8, 1998

    Accepted: --

    Published Online: Aug. 9, 2006

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    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology