Glass Enamel & Ophtalmic Optics, Volume. 53, Issue 6, 26(2025)

Through-hole Processing and Filling Technology for Glass Substrates in Chip Packaging

ZHANG Xingzhi1, TIAN Yingliang1,2、*, ZHAO Zhiyong1,2, and ZHANG Xun1,3
Author Affiliations
  • 1College of Materials Science and Engineering, Beijing University of Technology, Beijing 100124, China
  • 2National Engineering Research Center of FPD Glass Technology, Xianyang 712021, China
  • 3WG Tech (Jiangxi) Group Co., Ltd., Xinyu 338004, China
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    The processing and filling of through-holes in glass substrates are crucial technologies for fabrication of high-quality through glass via (TGV), which were essential for the advancement and integration of modern electronic devices. This paper systematically summarized the processing and filling techniques of TGV. The through-hole processing methods discussed include sandblasting, electrochemical discharge machining, glass reflow process, laser ablation, and laser-induced etching. The filling techniques for through-holes encompassed electroplating and conductive paste filling. Considering the current status of TGV processing and filling technologies and their applications in the advanced packaging field, the future development directions of TGV technology were proposed.

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    ZHANG Xingzhi, TIAN Yingliang, ZHAO Zhiyong, ZHANG Xun. Through-hole Processing and Filling Technology for Glass Substrates in Chip Packaging[J]. Glass Enamel & Ophtalmic Optics, 2025, 53(6): 26

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    Paper Information

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    Received: Aug. 4, 2024

    Accepted: Jul. 30, 2025

    Published Online: Jul. 30, 2025

    The Author Email: TIAN Yingliang (tianyl@bjut.edu.cn)

    DOI:10.13588/j.cnki.g.e.2096-7608.2025.06.005

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