Research and Progress on Optical Design of Exposure Systems in Extreme Ultraviolet Lithography

Yanqiu Li; Yanbei Nan; Yuqing Chen; Xu Yan; Xinyi Zhang; Lihui Liu

doi:10.3788/AOS230739

Acta Optica Sinica, Volume. 43, Issue 15, 1522002(2023)

Research and Progress on Optical Design of Exposure Systems in Extreme Ultraviolet Lithography

Yanqiu Li^*, Yanbei Nan, Yuqing Chen, Xu Yan, Xinyi Zhang, and Lihui Liu^**

Key Laboratory of Optoelectronic Imaging Technology and System, Ministry of Education, School of Optics and Photonics, Beijing Institute of Technology, Beijing 100081, China

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Yanqiu Li, Yanbei Nan, Yuqing Chen, Xu Yan, Xinyi Zhang, Lihui Liu. Research and Progress on Optical Design of Exposure Systems in Extreme Ultraviolet Lithography[J]. Acta Optica Sinica, 2023, 43(15): 1522002

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Paper Information

Category: Optical Design and Fabrication

Received: Mar. 29, 2023

Accepted: May. 19, 2023

Published Online: Aug. 15, 2023

The Author Email: Li Yanqiu (liyanqiu@bit.edu.cn), Liu Lihui (liulihui@bit.edu.cn)

DOI:10.3788/AOS230739

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