Opto-Mechanical Thermal Integration Analysis and Optimization of KrF Deep Ultraviolet Lithography Projection Lens

Xing Han; Lun Jiang; Yanwei Li; Junchi Li

doi:10.3788/AOS231895

Acta Optica Sinica, Volume. 44, Issue 7, 0722001(2024)

Opto-Mechanical Thermal Integration Analysis and Optimization of KrF Deep Ultraviolet Lithography Projection Lens

Xing Han^1,3, Lun Jiang^1,2、*, Yanwei Li^3、**, and Junchi Li³

Author Affiliations

¹School of Optoelectronic Engineering, Changchun University of Science and Technology, Changchun 130022, Jilin , China

²National and Local Joint Engineering Research Center of Space Photoelectric Technology, Changchun University of Science and Technology, Changchun 130022, Jilin , China

³Ji Hua Laboratory, Foshan 528200, Guangdong , China

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Figures & Tables(20)

Fig. 1. Optical system schematic diagram

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Fig. 2. Analysis, design and optimization of opto-mechanical thermal integration for deep ultraviolet lithography projection lens

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Fig. 3. Schematic diagram of component 17 support structure

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Fig. 4. Assembly drawing of mechanical support structure

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Fig. 5. Cross-sectional view of lithography projection lens after overall assembly

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Fig. 6. Material property relationship between optical component, adhesive layer, and support structure

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Fig. 7. Correction method based on vector height displacement

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Fig. 8. Simplified finite element model of whole structure

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Fig. 9. Surface deformation cloud image of component 17 when working at 20 ℃. (a) Surface 1 deformation cloud image; (b) surface 2 deformation cloud image

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Fig. 10. PV and RMS values of each surface of optical element under thermal-mechanical coupling condition

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Fig. 11. Sensitivity analysis of individual optical element

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Fig. 12. Sensitivity analysis of individual optical element

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Fig. 13. Wavefront aberration RMS diagram. (a) RMS wavefront aberration in different fields of view; (b) relationship between wavefront aberration and field of view

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Fig. 14. Sampled field Fringe Zernike polynomial coefficient

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Fig. 15. Calibrate F-tan θ distortion

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Table 1. Material properties

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Table 1. Material properties

Material	Density /（g/cm³）	Young modulus /GPa	Poisson's ratio	Coefficient of thermalexpansion /（℃^-1）	Thermal conductivity /（W · m^-1· ℃^-1）
Fused quartz	2.201	72.7	0.16	0.52×10^-6	1.38
Aluminium alloy 7075	2.810	72	0.25	23.50×10^-6	10
Invar steel 4J332	8.100	141	0.30	1.00×10^-6	13.9
60Si2Mn	7.850	206	0.28	11.50×10^-6	25.53
2216B/A gray 3M	1.300	0.689	0.43	102.00×10^-6	0.395

Table 2. Fringe Zernike polynomials and Seidel aberrations

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Table 2. Fringe Zernike polynomials and Seidel aberrations

No.	n	m	Zernike polynomial	Seidel aberration
1	0	0	1	Piston
2	1	1	$ρ c o s φ$	Tilt-X
3	1	1	$ρ s i n φ$	Tilt-Y
4	2	0	$2 ρ^{2} - 1$	Focus
5	2	2	$ρ^{2} c o s (2 φ)$	Astigmatism 0° or 90°
6	2	2	$ρ^{2} s i n (2 φ)$	Astigmatism $\pm$ 45°
7	3	1	$(3 ρ^{3} - 2 ρ) c o s φ$	X coma
8	3	1	$(3 ρ^{3} - 2 ρ) s i n φ$	Y coma
9	4	0	$6 ρ^{4} - 6 ρ^{2} + 1$	Spherical and focus

Table 3. Fringe Zernike polynomial coefficients under +2 ℃ temperature change limit

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Table 3. Fringe Zernike polynomial coefficients under +2 ℃ temperature change limit

No.	Optical element 1		Optical element 2		Optical element 3
No.	Surface 1 /mm	Surface 2 /mm	Surface 1 /mm	Surface 2 /mm	Surface 1 /mm	Surface 2 /nm
1	-2.427067×10^-9	1.424381×10^-9	-2.584727×10^-10	1.868567×10^-9	-9.524387×10^-9	-1.170215×10^-8
2	-2.483539×10^-10	-1.572861×10^-11	-1.621862×10^-11	4.844941×10^-11	-1.527468×10^-9	-1.680896×10^-9
3	-7.381892×10^-11	-1.665980×10^-13	2.340171×10^-11	1.358655×10^-10	-2.620776×10^-10	-2.798929×10^-10
4	7.337144×10^-6	7.475565×10^-6	2.221321×10^-6	5.756336×10^-6	8.358752×10^-6	9.106803×10^-5
5	-3.716965×10^-8	-7.785167×10^-8	-2.628440×10^-9	-4.784296×10^-9	8.219012×10^-9	1.060361×10^-8
6	8.205159×10^-9	1.587273×10^-8	-1.919281×10^-8	-1.143515×10^-8	-1.069341×10^-8	-1.452380×10^-8
7	6.711797×10^-9	3.852177×10^-9	-3.101850×10^-9	-1.853834×10^-9	-2.088006×10^-9	-1.917838×10^-9
8	7.415819×10^-9	5.649610×10^-9	7.077392×10^-10	1.723248×10^-10	-3.253933×10^-9	-4.701978×10^-9
9	2.404682×10^-6	-2.506335×10^-7	4.120477×10^-7	-1.878787×10^-6	-5.594270×10^-6	-4.678698×10^-6

Table 4. Image quality of optical system under condition of opto-mechanical thermal integration analysis

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Table 4. Image quality of optical system under condition of opto-mechanical thermal integration analysis

Parameter

Wave aberration RMS /

λ

Distortion /nm

0 fieldof view

0.3 fieldof view

0.5 fieldof view

0.707 fieldof view

0.8 fieldof view

1.0 fieldof view

Opto-mechanical thermal integration

analysis image quality

0.0669

0.0671

0.0751

0.0796

0.0712

25.61

Table 5. Comparison of image quality of optical system before and after opto-mechanical thermal integration analysis

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Table 5. Comparison of image quality of optical system before and after opto-mechanical thermal integration analysis

Parameter	Wave aberration RMS / $λ$						Distortion /nm
Parameter	0 fieldof view	0.3 fieldof view	0.5 fieldof view	0.707 field of view	0.8 field of view	1.0 fieldof view	Distortion /nm
Ideal image quality	0.0073	0.0312	0.0359	0.0333	0.0325	0.0391	<6.00
Opto-mechanical thermal integrationanalysis image quality （pre-optimization）	0.0669	0.0669	0.0671	0.0751	0.0796	0.0712	25.61
Opto-mechanical thermal integrationanalysis image quality （post-optimization）	0.0197	0.0305	0.0316	0.0328	0.0352	0.0422	5.71

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Xing Han, Lun Jiang, Yanwei Li, Junchi Li. Opto-Mechanical Thermal Integration Analysis and Optimization of KrF Deep Ultraviolet Lithography Projection Lens[J]. Acta Optica Sinica, 2024, 44(7): 0722001

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Paper Information

Category: Optical Design and Fabrication

Received: Dec. 6, 2023

Accepted: Jan. 5, 2024

Published Online: Apr. 11, 2024

The Author Email: Jiang Lun (jlciomp@163.com), Li Yanwei (yanwei201314@163.com)

DOI:10.3788/AOS231895

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology