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Acta Optica Sinica, Volume. 38, Issue 12, 1202001(2018)

Optimization of Atom Flux in Atom Lithography

Jie Chen**, Jie Liu, Li Zhu, Xiao Deng*, Xinbin Cheng, and Tongbao Li
Author Affiliations
  • School of Physics Science and Engineering, Tongji University, Shanghai 200092, China
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    Article index updated: Mar. 10, 2025

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    Jie Chen, Jie Liu, Li Zhu, Xiao Deng, Xinbin Cheng, Tongbao Li. Optimization of Atom Flux in Atom Lithography[J]. Acta Optica Sinica, 2018, 38(12): 1202001

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    Paper Information

    Category: Atomic and Molecular Physics

    Received: Jun. 14, 2018

    Accepted: Jul. 25, 2018

    Published Online: May. 10, 2019

    The Author Email:

    DOI:10.3788/AOS201838.1202001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology