INFRARED, Volume. 46, Issue 5, 17(2025)

Study on the Particle Cleaning Mechanism of Silicon-Based Infrared Chip After Polishing

Teng-da MA*, Sheng-xian XU, Hao-ran LI, Hao SHI, and Hui WANG
Author Affiliations
  • North China Research Institute of Electro-Optics, Beijing 100015
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    References(2)

    [15] [15] Shimizu M, Usui H, Suzumura T, et al. Analysis of the deterioration mechanism of Si electrode as a Li-ion battery anode using Raman micro spectroscopy[J].The Journal of Physical Chemistry C, 2015,119(6): 2975-2982.

    [16] [16] Raviv U, Klein J. Fluidity of bound hydration layers[J].Science, 2002,297(5586): 1540-1543.

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    MA Teng-da, XU Sheng-xian, LI Hao-ran, SHI Hao, WANG Hui. Study on the Particle Cleaning Mechanism of Silicon-Based Infrared Chip After Polishing[J]. INFRARED, 2025, 46(5): 17

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    Paper Information

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    Received: Oct. 21, 2024

    Accepted: Jun. 12, 2025

    Published Online: Jun. 12, 2025

    The Author Email: MA Teng-da (1498695847@qq.com)

    DOI:10.3969/j.issn.1672-8785.2025.05.003

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