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INFRARED, Volume. 46, Issue 5, 17(2025)

Study on the Particle Cleaning Mechanism of Silicon-Based Infrared Chip After Polishing

Teng-da MA*, Sheng-xian XU, Hao-ran LI, Hao SHI, and Hui WANG
Author Affiliations
  • North China Research Institute of Electro-Optics, Beijing 100015
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    MA Teng-da, XU Sheng-xian, LI Hao-ran, SHI Hao, WANG Hui. Study on the Particle Cleaning Mechanism of Silicon-Based Infrared Chip After Polishing[J]. INFRARED, 2025, 46(5): 17

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    Paper Information

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    Received: Oct. 21, 2024

    Accepted: Jun. 12, 2025

    Published Online: Jun. 12, 2025

    The Author Email: MA Teng-da (1498695847@qq.com)

    DOI:10.3969/j.issn.1672-8785.2025.05.003

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology