Acta Optica Sinica, Volume. 43, Issue 8, 0822017(2023)
Exposure System for Increasing Duty Cycle Uniformity of Holographic Grating Photoresist Masks
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Chenlu Xu, Yuxuan Zhao, Xinyu Mao, Lijiang Zeng. Exposure System for Increasing Duty Cycle Uniformity of Holographic Grating Photoresist Masks[J]. Acta Optica Sinica, 2023, 43(8): 0822017
Category: Optical Design and Fabrication
Received: Oct. 28, 2022
Accepted: Nov. 22, 2022
Published Online: Apr. 6, 2023
The Author Email: Zeng Lijiang (zenglj@tsinghua.edu.cn)