Acta Optica Sinica, Volume. 43, Issue 8, 0822017(2023)

Exposure System for Increasing Duty Cycle Uniformity of Holographic Grating Photoresist Masks

Chenlu Xu1, Yuxuan Zhao1, Xinyu Mao2, and Lijiang Zeng1、*
Author Affiliations
  • 1State Key Laboratory of Precision Measurement Technology and Instrument, Department of Precision Instrument, Tsinghua University, Beijing 100084, China
  • 2Beijing Greatar Tech Co., Ltd., Beijing 100089, China
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    [7] Xu C L, Zhao Y X, Zeng L J. Low-stray-light gratings fabricated with scanning exposure method based on Lloyd’s mirror for a high-contrast near-eye display in augmented reality[J]. Applied Optics, 61, 5626-5632(2022).

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    Chenlu Xu, Yuxuan Zhao, Xinyu Mao, Lijiang Zeng. Exposure System for Increasing Duty Cycle Uniformity of Holographic Grating Photoresist Masks[J]. Acta Optica Sinica, 2023, 43(8): 0822017

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Oct. 28, 2022

    Accepted: Nov. 22, 2022

    Published Online: Apr. 6, 2023

    The Author Email: Zeng Lijiang (zenglj@tsinghua.edu.cn)

    DOI:10.3788/AOS221891

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