Exposure System for Increasing Duty Cycle Uniformity of Holographic Grating Photoresist Masks

Chenlu Xu; Yuxuan Zhao; Xinyu Mao; Lijiang Zeng

doi:10.3788/AOS221891

Acta Optica Sinica, Volume. 43, Issue 8, 0822017(2023)

Exposure System for Increasing Duty Cycle Uniformity of Holographic Grating Photoresist Masks

Chenlu Xu¹, Yuxuan Zhao¹, Xinyu Mao², and Lijiang Zeng^1、*

¹State Key Laboratory of Precision Measurement Technology and Instrument, Department of Precision Instrument, Tsinghua University, Beijing 100084, China

²Beijing Greatar Tech Co., Ltd., Beijing 100089, China

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Figures & Tables(8)

Fig. 1. Exposure dose modulation setup based on Lloyd's mirror. (a) Top view; (b) sectional view of plane S

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Fig. 2. Normalized exposure dose distributions before and after optimization. (a) Before optimization; (b) after optimization

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Fig. 3. Calibration of duty cycle in AFM image using SEM image (456 nm period). (a) SEM image; (b) AFM image

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Fig. 4. Schematic of optical path of imaging test

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Fig. 5. AFM test results of 2D-grating photoresist masks

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Fig. 6. Solid color imaging results captured by phone. (a) (c) Without modulation of exposure; (b) (d) with modulation of exposure

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Table 1. Duty cycles of 2D-grating photoresist masks

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Table 1. Duty cycles of 2D-grating photoresist masks

Position	Duty cycle for 456 nm period		Duty cycle for 329 nm period
Position	Without modulation	With modulation	Without modulation	With modulation
Position 1	0.52	0.49	0.53	0.47
Position 2	0.41	0.47	0.36	0.51
Position 3	0.44	0.47	0.42	0.52
Position 4	0.38	0.51	0.30	0.50
Position 5	0.34	0.53	0.34	0.51
Range	0.18	0.06	0.23	0.05
Reduction factor /%	66.7		78.3

Table 2. Imaging uniformity indicators
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Table 2. Imaging uniformity indicators
Uniformity indicator V_Afor 456 nm period V_P for 456 nm period V_A for 329 nm period V_P for 329 nm period
Reduction factor /% 38.3 42.9 31.7 59.0
Without modulation 0.60 0.35 0.63 0.39
With Modulation 0.37 0.20 0.43 0.16

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Chenlu Xu, Yuxuan Zhao, Xinyu Mao, Lijiang Zeng. Exposure System for Increasing Duty Cycle Uniformity of Holographic Grating Photoresist Masks[J]. Acta Optica Sinica, 2023, 43(8): 0822017

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