[1] WANG Haoran, LIU Yunfei, LIU Hui et al. Effect of various oxidants on reaction mechanisms self-limiting natures and structural characteristics of Al2O3 films grown by atomic layer deposition[J]. Advanced Materials Interfaces, 5, 1701248(2018).

[2] XIANG Cao, WANG Dengkui, FANG Xuan et al. Effect of atomic layer deposition Al2O3 passivation on the luminescence properties of InAs/InGaAsSb type-II superlattices[J]. Acta Photonica Sinica, 53, 0753308(2024).

[3] MUNESHWAR T, CADIEN K. Pulsed atomic layer deposition: Numerical growth model and experiments[J]. Journal of Applied Physics, 119, 085306(2016).

[4] DENG Zhang, HE Wenjie, DUAN Chenlong et al. Atomic layer deposition process optimization by computational fluid dynamics[J]. Vacuum, 123, 103-110(2016).

[5] KARUTURI S K, LIU Lijun, SU L T et al. Kinetics of stop-flow atomic layer deposition for high aspect ratio template filling through photonic band gap measurements[J]. Journal of Physical Chemistry C, 114, 14843-14848(2010).

[6] SCHWILLE M C, SCHÖSSLER T, BARTH J et al. Experimental and simulation approach for process optimization of atomic layer deposited thin films in high aspect ratio 3D structures[J]. Journal of Vacuum Science & Technology, A 35, 01-118(2017).

[7] VAN BUI H, GRILLO F, VAN OMMEN J R. Atomic and molecular layer deposition: off the beaten track[J]. Chemical Communications, 53, 45-71(2017).

[8] KNOOPS H C M, LANGEREIS E, KESSELS W M M. Conformality of plasma-assisted ALD: physical processes and modeling[J]. Journal of Electrochemical Society, 157, G241-G249(2010).

[9] FRENCH P J, KRIJNEN G, ROOZEBOOM F. Precision in harsh environments[J]. Microsystems & Nanoengineering, 2, 16048(2016).

[10] LI Fangzuo, LIU Zhiguo, SUN Tianxi. Annular beam high-intensity X-ray diffraction based on an ellipsoidal single-bounce monocapillary[J]. Journal of Applied Crystallography, 49, 627-631(2016).

[11] SUN Xuepin, SHAO SHANGKUN, LI Huiquan et al. A procedure for the characterization of monocapillary X-Ray lenses as condensers for full-field transmission X-Ray microscopes[J]. Frontiers in Physics, 10, 821549(2022).

[12] SUN Xueping, ZHANG Xiaoyun, ZHU Yu et al. 13.1 micrometers hard X-ray focusing by a new type monocapillary X-ray optic designed for common laboratory X-ray source[J]. Nuclear Instruments & Methods in Physics Research, 888, 13-17(2018).

[13] HUANG Qiushi, QI Runze, ZHANG Zhe et al. Development of high performance and large size X-ray multilayer reflective optics[J]. Optics and Precision Engineering, 30, 2793-2804(2022).

[14] LI Yanli, WU Hongchang, LV Wensi et al. Improved uniformity of atomic-layer-deposited HfO2 film along the length of glass monocapillary with high length-diameter ratio[J]. Optical Materials, 152, 115440(2024).

[15] WANG Yabin, LI Yanli, SHAO Shankun et al. Enhancement of properties of high-density material coated glass monocapillary X-ray condenser based on atomic layer deposition[J]. Optics Communications, 464, 125544(2020).

[16] LI Yanli, LV Wensi, KONG Xiangdong et al. Design of a monocapillary with an inner Al2O3/HfO2 multilayer to obtain focused monochromatic hard X-rays[J]. Applied Optics, 63, 2837-2842(2024).

[17] SHAERI M R, JEN T C, YUAN C Y et al. Investigating atomic layer deposition characteristics in multi-outlet viscous flow reactors through reactor scale simulations[J]. International Journal of Heat and Mass Transfer, 89, 468-481(2015).

[18] OVIROH P O, AKBARZADEH R, PAN Dongqing et al. New development of atomic layer deposition: processes, methods and applications[J]. Science and Technology of Advanced Materials, 20, 465-496(2019).

[19] ZHU Ming, WANG Yong. CFD simulation for atomic layer deposition on large scale ceramic membranes[J]. Ciesc Journal, 67, 3720-3729(2016).

[20] MARKOV L K, PAVLUCHENKO A S, SMIRNOVA I P et al. Study of deposition of Al2O3 nanolayers by atomic layer deposition on the structured ITO films[J]. Semiconductors, 57, 257-262(2024).

[21] ZHANG Yichi, DING Yangyao, CHRISTOFIDES D P. Multiscale computational fluid dynamics modeling of thermal atomic layer deposition with application to chamber design[J]. Chemical Engineering Research & Design, 147, 529-544(2019).

[22] DING Zurong[M]. Fluid mechanics part one, 29-30(2003).

[23] LI Shijiu[M]. Engineering fluid mechanics, 197-202(1980).

[24] MASANGO S S, HACKLER R A, LARGE N et al. High-resolution distance dependence study of surface-enhanced raman scattering enabled byatomic layer deposition[J]. Nano Letters, 16, 4251-4259(2016).