OPTICS & OPTOELECTRONIC TECHNOLOGY, Volume. 18, Issue 6, 86(2020)

Changing Rules of Deposition Rate with Time in Ion Beam Sputtering System

LI Ding*, LI Qian-tao, and XIONG Chang-xin
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    References(9)

    [3] [3] Cheng-Chung Lee, Jin-Cherng Hsu, Daw-Hang Wong. The characteristics of some metallic oxides prepared in high vacuum by ion beam sputtering[J]. Applied Surface Science, 2001, 171(1-2): 151-156.

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    [5] [5] Detlev Ristau, Tobias Grob. Ion beam sputter coatings for laser technology[C]. SPIE, 2005, 5963(13): 1-12.

    [6] [6] James D Targove, H Angus Macleod. Verification of momentum transfer as the dominant densifying mechanism in ion-assisted deposition[J]. Applied Optics, 1988, 27(18): 3779-3781.

    [7] [7] Jurgen Becker, Volker Scheuer. Coatings for optical applications produced by ion beam sputter deposition[J]. Applied Optics, 1990, 29(28): 4303-4309.

    [8] [8] Eda Cetinorgu, Bill Baloukas, Oleg Zabeida, et al. Mechanical and thermoelastic characteristics of optical thin films deposited by dual ion beam sputtering[J]. Applied Optics, 2009, 48(23): 4536-4544.

    [9] [9] Cheng-Chung Lee, Chuen-Lin Tien, Jin-Cherng Hsu. Internal stress and optical properties of Nb2O5 thin films deposited by ion-beam sputtering[J]. Appl. Opt., 2002, 41(10): 2043-2047.

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    LI Ding, LI Qian-tao, XIONG Chang-xin. Changing Rules of Deposition Rate with Time in Ion Beam Sputtering System[J]. OPTICS & OPTOELECTRONIC TECHNOLOGY, 2020, 18(6): 86

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    Paper Information

    Category:

    Received: Nov. 26, 2019

    Accepted: --

    Published Online: Aug. 23, 2021

    The Author Email: Ding LI (dingfengju321@126.com)

    DOI:

    CSTR:32186.14.

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