OPTICS & OPTOELECTRONIC TECHNOLOGY, Volume. 18, Issue 6, 86(2020)

Changing Rules of Deposition Rate with Time in Ion Beam Sputtering System

LI Ding*, LI Qian-tao, and XIONG Chang-xin
Author Affiliations
  • [in Chinese]
  • show less
    Figures & Tables(0)
    Tools

    Get Citation

    Copy Citation Text

    LI Ding, LI Qian-tao, XIONG Chang-xin. Changing Rules of Deposition Rate with Time in Ion Beam Sputtering System[J]. OPTICS & OPTOELECTRONIC TECHNOLOGY, 2020, 18(6): 86

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category:

    Received: Nov. 26, 2019

    Accepted: --

    Published Online: Aug. 23, 2021

    The Author Email: Ding LI (dingfengju321@126.com)

    DOI:

    CSTR:32186.14.

    Topics