Journal of Synthetic Crystals, Volume. 52, Issue 2, 271(2023)
Optimal Process Parameters of Preparing MoS2 Films by RF Magnetron Sputtering
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ZHANG Junfeng, SUN Zaizheng, KONG Tengfei, CAI Genwang, LI Yaping, HU Sha, FAN Zhiqin. Optimal Process Parameters of Preparing MoS2 Films by RF Magnetron Sputtering[J]. Journal of Synthetic Crystals, 2023, 52(2): 271
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Received: Aug. 20, 2022
Accepted: --
Published Online: Mar. 18, 2023
The Author Email: Junfeng ZHANG (Leo10zjf@163.com)
CSTR:32186.14.