Journal of Synthetic Crystals, Volume. 52, Issue 2, 271(2023)

Optimal Process Parameters of Preparing MoS2 Films by RF Magnetron Sputtering

ZHANG Junfeng*, SUN Zaizheng, KONG Tengfei, CAI Genwang, LI Yaping, HU Sha, and FAN Zhiqin
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    ZHANG Junfeng, SUN Zaizheng, KONG Tengfei, CAI Genwang, LI Yaping, HU Sha, FAN Zhiqin. Optimal Process Parameters of Preparing MoS2 Films by RF Magnetron Sputtering[J]. Journal of Synthetic Crystals, 2023, 52(2): 271

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    Paper Information

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    Received: Aug. 20, 2022

    Accepted: --

    Published Online: Mar. 18, 2023

    The Author Email: Junfeng ZHANG (Leo10zjf@163.com)

    DOI:

    CSTR:32186.14.

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