NUCLEAR TECHNIQUES, Volume. 48, Issue 3, 030102(2025)

Emulation of synchrotron radiation high-resolution actinic review for EUV mask

Zijing SU1,3, Haigang LIU1,2, Xiangyu MENG1,2, Xiangzhi ZHANG1,2, Bo ZHAO1, Zhi GUO1,2, Yong WANG1,2、**, and Renzhong TAI1,2,3、*
Author Affiliations
  • 1Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai 201210, China
  • 2Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China
  • 3ShanghaiTech University, Shanghai 201210, China
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    References(25)

    [13] Bakshi V[M]. EUV Lithography, 325-381(2009).

    [21] YAO Hanmin, HU Song, XING Tingwen[M]. Optical projection exposure micro-nano processing technology, 172-217(2006).

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    Zijing SU, Haigang LIU, Xiangyu MENG, Xiangzhi ZHANG, Bo ZHAO, Zhi GUO, Yong WANG, Renzhong TAI. Emulation of synchrotron radiation high-resolution actinic review for EUV mask[J]. NUCLEAR TECHNIQUES, 2025, 48(3): 030102

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    Paper Information

    Category: SYNCHROTRON RADIATION TECHNOLOGY AND APPLICATIONS

    Received: Apr. 15, 2024

    Accepted: --

    Published Online: Apr. 15, 2025

    The Author Email: Yong WANG (王勇), Renzhong TAI (邰仁忠)

    DOI:10.11889/j.0253-3219.2025.hjs.48.240151

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