NUCLEAR TECHNIQUES, Volume. 48, Issue 3, 030102(2025)

Emulation of synchrotron radiation high-resolution actinic review for EUV mask

Zijing SU1,3, Haigang LIU1,2, Xiangyu MENG1,2, Xiangzhi ZHANG1,2, Bo ZHAO1, Zhi GUO1,2, Yong WANG1,2、**, and Renzhong TAI1,2,3、*
Author Affiliations
  • 1Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai 201210, China
  • 2Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China
  • 3ShanghaiTech University, Shanghai 201210, China
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    Figures & Tables(9)
    Schematic diagram of the optical path of the EUV mask imaging analysis system platform at SSRF (a) Conventional circular off-axis zone plate, (b) Anamorphic elliptical off-axis zone plate
    Reflectivity of multilayers on an EUV mask at 13.5-nm wavelength as a function of the angle of incidence (a), apertures of 4×NA=0.625 circle and anamorphic zone plate at 10° in comparison and range of angles of the associated ray cones (b)
    Imaging of circular off-axis zone plates with 4×NA=0.625 (color online) (a) Mask hp=22 nm, (b) hp=20 nm imaging under horizontal extreme dipole illumination, (c) hp=22 nm imaging under horizontal extreme dipole illumination, (d) hp=26 nm imaging under horizontal extreme dipole illumination, (e) The cross-section distribution curve of imaging results (section position y=0 nm)
    Imaging of two dimension L-shaped mask (color online) (a) L-shaped mask hp=22 nm, (b) Mask imaging under annular illumination, (c) Mask imaging under extreme quadrupole illumination, (d) The cross-section distribution curve of imaging results (section position x=60 nm, y=60 nm)
    Elliptical off-axis zone plate imaging with anisotropic numerical aperture (color online)(a) Mask hp=12 nm, (b) Imaging of hp=12 nm with 4×NA=1.15 and 0.575, (c) Imaging of hp=14 nm with 4×NA=1.0 and 0.5, (d) Imaging of hp=14 nm with 4×NA=0.94 and 0.625, (e) The cross-section distribution curve of imaging results for hp=12 nm (y=0 nm), (f) The cross-section distribution curve of imaging results for hp=14 nm (section position y=0 nm)
    Elliptical off-axis zone plate imaging with anisotropic numerical aperture (color online) (a) Two dimension L-shaped mask, vertical direction hp=12 nm, horizontal direction hp=24 nm, (b) Mask imaging under annular illumination, (c) Mask imaging under extreme quadrupole illumination, (d) The cross-section distribution curve of imaging results of hp=12 nm (y=60 nm), (e) The cross-section distribution curve of imaging results of hp=24 nm (section position x=120 nm)
    Elliptical off-axis zone plate imaging with anisotropic numerical aperture (color online) (a) Two dimension L-shaped line pairs, with hp=24 nm in both directions, (b) Uniform intensity quadrupole illumination pupil pattern, (c) Light intensity distribution 1:20 quadrupole illumination pupil pattern, (d~f) Imaging results of quadrupole illumination corresponding to light intensities of 1:1, 1:5, and 1:20, (g) The cross-section distribution curve of imaging results (section position x=0 nm, y=80 nm)
    • Table 1. Mask pattern half-pitch resolution with high-NA zone plates

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      Table 1. Mask pattern half-pitch resolution with high-NA zone plates

      半节距分辨率Half-pitch resolution相干Coherent / nm非相干Incoherent / nm偶极子Dipole / nm
      CRAMask NAWafer 4×NARc=λ / 2NARr=1.22λ / 4NARl=λ / 4NA
      10°0.156 30.625432622
    • Table 2. Mask pattern half-pitch resolution with anamorphic high-NA elliptical zone plates (CRA is central ray angles)

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      Table 2. Mask pattern half-pitch resolution with anamorphic high-NA elliptical zone plates (CRA is central ray angles)

      半节距成像分辨率Half-pitch imaging resolution非相干Incoherent / nm偶极子Dipole / nm
      CRAMask reflective angle方向DirectionWafer 4×NARr=1.22λ/4NARl=λ/4NA
      10°1°~19°水平Horizontal0.9417.514.4
      垂直Vertical0.6252622
      1°~17°水平Horizontal1.016.513.5
      垂直Vertical0.53327
      1°~19°水平Horizontal1.1514.311.7
      垂直Vertical0.57528.623.5
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    Zijing SU, Haigang LIU, Xiangyu MENG, Xiangzhi ZHANG, Bo ZHAO, Zhi GUO, Yong WANG, Renzhong TAI. Emulation of synchrotron radiation high-resolution actinic review for EUV mask[J]. NUCLEAR TECHNIQUES, 2025, 48(3): 030102

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    Paper Information

    Category: SYNCHROTRON RADIATION TECHNOLOGY AND APPLICATIONS

    Received: Apr. 15, 2024

    Accepted: --

    Published Online: Apr. 15, 2025

    The Author Email: Yong WANG (王勇), Renzhong TAI (邰仁忠)

    DOI:10.11889/j.0253-3219.2025.hjs.48.240151

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