Chinese Journal of Lasers, Volume. 50, Issue 13, 1305003(2023)
Design and Simulation of Illumination Uniformity Unit in Lithography Illumination Systems
Fig. 2. Illumination modes and partial coherence factor. (a) Conventional illumination; (b) annular illumination; (c) dipole illumination; (d) quadrupole illumination
Fig. 5. Schematics of the optical principle of the integrator rod. (a) Angle channels; (b) virtual point sub-sources
Fig. 6. Variation of the input with a uniform distribution after free propagation. (a) Uniform distribution of the input in phase space; (b) distribution in phase space after free propagation of the input; (c) irradiance distribution of the input; (d) irradiance distribution of the unfolded output
Fig. 7. Superposition distribution results of edge channels. (a) A uniform result; (b) a non-uniform result
Fig. 8. Simulation results of the output irradiance profile under different source widths in x direction. (a) Width of the source is smaller than that of the integrator rod; (b) width of the source is equal to that of the integrator rod
Fig. 9. Structure scheme of the proposed illumination uniformity unit. (a) Structure in the X direction (top view); (b) structure in the Y direction (front view)
Fig. 10. Geometric principle of the ray distribution in the uniformity unit (top view)
Fig. 12. Profile of absolute error of the exiting rays’ direction cosine of the micro-cylindrical lens
Fig. 14. Profile of absolute error of the exiting rays’ direction cosine of the condenser lens
Fig. 15. Simulation model for the illumination uniformity unit (axonometric view)
Fig. 16. Diagram and profile of irradiance of the input illumination field under the conventional mode with σ=0.88
Fig. 17. Diagram of irradiance of the output illumination field under the conventional mode with σ=0.88
Fig. 18. Normalized integrated irradiance profiles. (a) Conventional illumination mode; (b) annular illumination mode
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Gang Wang, Zhongliang Li, Chunxiao Yuan, Fang Zhang. Design and Simulation of Illumination Uniformity Unit in Lithography Illumination Systems[J]. Chinese Journal of Lasers, 2023, 50(13): 1305003
Category: Beam transmission and control
Received: Nov. 21, 2022
Accepted: Feb. 25, 2023
Published Online: Jun. 6, 2023
The Author Email: Li Zhongliang (lizhongliang@siom.ac.cn)