Design and Simulation of Illumination Uniformity Unit in Lithography Illumination Systems

Gang Wang; Zhongliang Li; Chunxiao Yuan; Fang Zhang

doi:10.3788/CJL221435

Chinese Journal of Lasers, Volume. 50, Issue 13, 1305003(2023)

Design and Simulation of Illumination Uniformity Unit in Lithography Illumination Systems

Gang Wang^1,2, Zhongliang Li^1,2、*, Chunxiao Yuan¹, and Fang Zhang¹

¹Laboratory of Information Optics and Opto-Electronics Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²University of Chinese Academy of Sciences, Beijing 100049, China

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Gang Wang, Zhongliang Li, Chunxiao Yuan, Fang Zhang. Design and Simulation of Illumination Uniformity Unit in Lithography Illumination Systems[J]. Chinese Journal of Lasers, 2023, 50(13): 1305003

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Paper Information

Category: Beam transmission and control

Received: Nov. 21, 2022

Accepted: Feb. 25, 2023

Published Online: Jun. 6, 2023

The Author Email: Li Zhongliang (lizhongliang@siom.ac.cn)

DOI:10.3788/CJL221435

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology