Optoelectronic Technology, Volume. 43, Issue 1, 48(2023)
Research on the Influence and the Method Control of Cu/Ti Etchant Concentration during the Process of Metal Oxide Field‑effect Transistor
The etching mechanism of Cu/Ti etchant and the change of etchant concentration was experimentally analyzed. On the basis, the changing curve of etchant concentration was clearly checked by experimental results. The control method of Cu/Ti etchant concentration was also suggested. And then, the life time and stability of Cu/Ti etchant was obvious improved,providing some reference for the research and production of related field.
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Hui ZHAO. Research on the Influence and the Method Control of Cu/Ti Etchant Concentration during the Process of Metal Oxide Field‑effect Transistor[J]. Optoelectronic Technology, 2023, 43(1): 48
Category: Research and Trial-manufacture
Received: Dec. 26, 2022
Accepted: --
Published Online: Apr. 14, 2023
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