Optoelectronic Technology, Volume. 43, Issue 1, 48(2023)

Research on the Influence and the Method Control of Cu/Ti Etchant Concentration during the Process of Metal Oxide Field‑effect Transistor

Hui ZHAO
Author Affiliations
  • ——(Nanjing BOE Display Technology Co., Ltd., Nanjing 210033, CHN)
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    The etching mechanism of Cu/Ti etchant and the change of etchant concentration was experimentally analyzed. On the basis, the changing curve of etchant concentration was clearly checked by experimental results. The control method of Cu/Ti etchant concentration was also suggested. And then, the life time and stability of Cu/Ti etchant was obvious improved,providing some reference for the research and production of related field.

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    Hui ZHAO. Research on the Influence and the Method Control of Cu/Ti Etchant Concentration during the Process of Metal Oxide Field‑effect Transistor[J]. Optoelectronic Technology, 2023, 43(1): 48

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    Paper Information

    Category: Research and Trial-manufacture

    Received: Dec. 26, 2022

    Accepted: --

    Published Online: Apr. 14, 2023

    The Author Email:

    DOI:10.19453/j.cnki.1005-488x.2023.01.008

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