[4] [4] A. Callegari, E. Cartier, M. Gribelyuk et al.. Physical and electrical characterization of Hafnium oxide and Hafnium silicate sputtered films [J]. J. Appl. Phys., 2001, 90(12):6466～6475

[5] [5] H. Grüger, Ch. Kunath, E. Kurth et al.. High quality r.f. sputtered metal oxides (Ta2O5, HfO2) and their properties after annealing [J]. Thin Solid Films, 2004, 447-448:509～515

[6] [6] Roland Thielsch, Alexandre Gatto, Norbert Kaiser. Mechanical stress and thermal-elastic properties of oxide coatings for use in the deep-ultraviolet spectral region [J]. Appl. Opt., 2002, 41(16):3211～3216

[7] [7] Tomoya Ohno, Desheng Fu, Hisao Suzuki et al.. Residual stress in lead titanate thin film on different substrates [J]. Journal of the European Ceramic Society, 2004, 24:1669～1672

[8] [8] S. Capraro, M. Le Berre, J. P. Chatelon et al.. Properties of barium ferrite sputtered films [J]. Sensors and Actuators A, 2004, 113:382～386

[9] [9] P. Zanola, E. Bontempi, C. Ricciardi et al.. Characterization of silicon carbide thin films grown on Si and SiO2/Si substrates [J]. Materials Science and Engineering B, 2004, 114-115:279～283

[10] [10] S. Tamulevicius. Stress and strain in the vacuum deposited thin films [J]. Vacuum, 1998, 51(2):127～139

[12] [12] H. A. Macleod. Thin-Film Optical Filters [M]. London: Institute of Physics Publishing, 1986

[13] [13] H. Leplan, B. Geenen, J. Y. Robic et al.. Residual stresses in evaporated silicon dioxide thin films:correlation with deposition parameters and aging behavior [J]. J. Appl. Phys., 1995, 78(2):962～968

[14] [14] H. Leplan, J. Y. Robic, Y. Pauleau. Kinetics of residual stress evolution in evaporated silicon dioxide films exposed to room air [J]. J. Appl. Phys., 1996, 79(9):6926～6931