Chinese Journal of Lasers, Volume. 33, Issue 6, 827(2006)

Influences of Deposition Temperature on Residual Stress of HfO2 Films Prepared by Electron Beam Evaporation

[in Chinese]1,2、*, [in Chinese]1, [in Chinese]1, and [in Chinese]1
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Influences of Deposition Temperature on Residual Stress of HfO2 Films Prepared by Electron Beam Evaporation[J]. Chinese Journal of Lasers, 2006, 33(6): 827

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    Paper Information

    Category: materials and thin films

    Received: Dec. 6, 2005

    Accepted: --

    Published Online: Jun. 13, 2006

    The Author Email: (shenyanming@mail.siom.ac.cn)

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