Influence of Reflection-Induced Retardance on the Measurement of Fabry-Perot Etalon Interval

Jiayin Yu; Jing Fan; Xuhui Lan; Xiaoyan Shen; Jing Yu

doi:10.3788/LOP57.091201

Laser & Optoelectronics Progress, Volume. 57, Issue 9, 091201(2020)

Influence of Reflection-Induced Retardance on the Measurement of Fabry-Perot Etalon Interval

Jiayin Yu¹, Jing Fan², Xuhui Lan¹, Xiaoyan Shen^1、*, and Jing Yu¹

Author Affiliations

¹College of Metrology & Measurement Engineering, China Jiliang University, Hangzhou, Zhejiang 310018, China;

²Technical Monitoring Center of Changqing Oilfield Company, Xi'an, Shaanxi 710021, China

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Figures & Tables(7)

Fig. 1. Interference schematic. (a) F-P etalon interference imaging schematic; (b) flat panel enlargement

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Fig. 2. Comparison of theoretical and simulation values

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Fig. 3. F-P etalon spacing measurement experimental device

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Fig. 4. Concentric interference ring pictures. (a) Concentric interference rings of 546 nm mercury green line; (b) concentric interference rings of 577 nm and 579 nm mercury yellow lines

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Table 1. TFCalc film system design parameters
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Table 1. TFCalc film system design parameters
Film Material Opticalthickness Physicalthickness /nm
1 ZNS λ/4 59.35
2 MGF2 λ/4 98.55
3 ZNS λ/4 59.35
4 MGF2 λ/4 98.55
5 ZNS λ/4 59.35
6 MGF2 λ/4 98.55
7 ZNS λ/4 59.35
8 MGF2 λ/4 98.55
9 ZNS λ/4 59.35

Table 2. Results of diameter and standard deviation of imaging ring obtained by F-P etalon with three wavelengths

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Table 2. Results of diameter and standard deviation of imaging ring obtained by F-P etalon with three wavelengths

λ_a₁=576.96607 nm $\begin{matrix} {\tilde{k}}_{01} \end{matrix}$ =6987; relative unit: 2 $\begin{matrix} \sqrt[]{2} \end{matrix}$ w			λ_a₂=579.07252 nm $\begin{matrix} {\tilde{k}}_{02} \end{matrix}$ =6961; relative unit: 2 $\begin{matrix} \sqrt[]{2} \end{matrix}$ w			λ_a₃=546.07942 nm $\begin{matrix} {\tilde{k}}_{03} \end{matrix}$ =7381; relative unit: 2 $\begin{matrix} \sqrt[]{2} \end{matrix}$ w
i	D_i	$\begin{matrix} s_{D_{i}} \end{matrix}$	i	D_i	$\begin{matrix} s_{D_{i}} \end{matrix}$	i	D_i	$\begin{matrix} s_{D_{i}} \end{matrix}$
1	678.867	0.193	1	584.772	0.033	1	691.254	0.010
2	867.039	0.211	2	796.093	0.077	2	867.746	0.012
3	1021.180	0.193	3	962.216	0.075	3	1014.056	0.017
7	1486.588	0.091	7	1447.684	0.055	7	1460.179	0.027
8	1581.844	0.080	8	1546.116	0.069	8	1552.212	0.031
9	1671.868	0.075	9	1638.089	0.058	9	1638.431	0.029

Table 3. Decimal ε before and after three wavelengths correction and its uncertainty
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Table 3. Decimal ε before and after three wavelengths correction and its uncertainty
ε U_ε U_d/d ε' U'_ε U'_d/d'
λ₁ 0.57814 0.00841 1.2×10^-6 0.58205 0.00461 6.9×10^-7
λ₂ 0.16989 0.01551 2.2×10^-6 0.17144 0.00824 1.2×10^-6
λ₃ 0.73376 0.01472 2.0×10^-6 0.73612 0.00777 1.1×10^-6

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Jiayin Yu, Jing Fan, Xuhui Lan, Xiaoyan Shen, Jing Yu. Influence of Reflection-Induced Retardance on the Measurement of Fabry-Perot Etalon Interval[J]. Laser & Optoelectronics Progress, 2020, 57(9): 091201

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Paper Information

Category: Instrumentation, Measurement and Metrology

Received: Aug. 14, 2019

Accepted: Sep. 16, 2019

Published Online: May. 6, 2020

The Author Email: Xiaoyan Shen (xyshen@cjlu.edu.cn)

DOI:10.3788/LOP57.091201

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology

Table 1. TFCalc film system design parameters

Table 1. TFCalc film system design parameters

Table 2. Results of diameter and standard deviation of imaging ring obtained by F-P etalon with three wavelengths

Table 2. Results of diameter and standard deviation of imaging ring obtained by F-P etalon with three wavelengths

Table 3. Decimal ε before and after three wavelengths correction and its uncertainty

Table 3. Decimal ε before and after three wavelengths correction and its uncertainty