The conventional atomic force microscope (AFM) and critical-dimension atomic force microscope (CD-AFM) probes are limited by the low effective scanning height of the tip, which prevents the accurate scanning and imaging of deep trenches and large overhanging sidewall structures. Hence, a design and preparation scheme for a new CD-AFM probe with a large-aspect-ratio tip structure is proposed herein. The developed CD-AFM probe has an effective tip height of 5.1-5.8 μm and an aspect ratio of 14. The improved effective height is approximately four times that of conventional silicon-based CD-AFM probes. Finally, the developed probe isevaluated using a deep-trench sample with a nominal depth of 2.3 μm and an aspect ratio of 4.6.