Optoelectronic Technology, Volume. 42, Issue 2, 129(2022)
Study on Developing Process of Large‑size Mask
Figures & Tables(12)
Fig. 1. Development and imaging flow chart of positive photoresist
Table 1. The CD data of Spray development
View tableView in ArticleTable 1. The CD data of Spray development
单位/μm #1 #2 #3 目标值 2 2 2 平均值 2.086 4 2.099 3 2.106 8 最大值 2.142 8 2.155 0 2.170 9 最小值 2.022 8 2.031 0 2.058 3 极差 0.119 9 0.124 0 0.112 6 偏差 0.086 4 0.099 3 0.106 8
Table 2. The CD data of Slit development
View tableView in ArticleTable 2. The CD data of Slit development
单位/μm #4 #5 #6 目标值 2 2 2 平均值 2.049 2 2.062 3 2.035 7 最大值 2.099 3 2.104 7 2.085 7 最小值 2.025 4 2.019 6 2.002 1 极差 0.073 9 0.085 1 0.836 偏差 0.049 2 0.062 3 0.035 7
Table 3. Comparison between advantages and disadvantages of two developing spraying methods
View tableView in ArticleTable 3. Comparison between advantages and disadvantages of two developing spraying methods
喷液方式 连续喷雾 狭缝液帘 优点 冲击力小 工艺维护便利 药液消耗量小 工艺稳定性高 药液覆盖迅速 CD分布更加均匀 缺点 冲击力大 药液消耗量较大 影响因素较多 工艺维护繁琐 工艺宽容性低
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Huachao ZHANG, Xiang GE, Qilong XIONG. Study on Developing Process of Large‑size Mask[J]. Optoelectronic Technology, 2022, 42(2): 129
Paper Information
Category: Research and Trial-manufacture
Received: Dec. 28, 2021
Accepted: --
Published Online: Jul. 29, 2022
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