Thickness Control and Thermal Stability of Large‐Diameter Mo/Si Multilayer Films for Extreme Ultraviolet Source

Xiangyue Liu; Zhe Zhang; Li Jiang; Hongxuan Song; Dianxiang Yao; Siyi Huang; Wenjie Xu; Tonglin Huo; Hongjun Zhou; Runze Qi; Qiushi Huang; Zhong Zhang; Zhanshan Wang

doi:10.3788/CJL231540

Chinese Journal of Lasers, Volume. 51, Issue 7, 0701014(2024)

Thickness Control and Thermal Stability of Large‐Diameter Mo/Si Multilayer Films for Extreme Ultraviolet Source

Xiangyue Liu¹, Zhe Zhang^1、*, Li Jiang¹, Hongxuan Song², Dianxiang Yao¹, Siyi Huang¹, Wenjie Xu³, Tonglin Huo³, Hongjun Zhou³, Runze Qi¹, Qiushi Huang^1、**, Zhong Zhang¹, and Zhanshan Wang¹

Author Affiliations

¹Institute of Precision Optical Engineering, School of Physical Science and Engineering, Tongji University, Shanghai 200092, China

²College of Sciences, Shanghai University, Shanghai 200444, China

³National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, Anhui , China

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Xiangyue Liu, Zhe Zhang, Li Jiang, Hongxuan Song, Dianxiang Yao, Siyi Huang, Wenjie Xu, Tonglin Huo, Hongjun Zhou, Runze Qi, Qiushi Huang, Zhong Zhang, Zhanshan Wang. Thickness Control and Thermal Stability of Large‐Diameter Mo/Si Multilayer Films for Extreme Ultraviolet Source[J]. Chinese Journal of Lasers, 2024, 51(7): 0701014

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Paper Information

Category: laser devices and laser physics

Received: Dec. 19, 2023

Accepted: Mar. 6, 2024

Published Online: Apr. 17, 2024

The Author Email: Zhe Zhang (zzgight@tongji.edu.cn), Qiushi Huang (huangqs@tongji.edu.cn)

DOI:10.3788/CJL231540

CSTR:32183.14.CJL231540

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology