[1] [1] S. Zhou, Y. Yang, L. Zhao et al.. Tilt-modulated spatial phase imaging method for wafer-mask leveling in proximity lithography［J］. Opt. Lett., 2010, 35(18): 3132～3134

[2] [2] S. L. Zhou, Y. Q. Fu, X. P. Tang et al.. Fourier-based analysis of moiré fringe patterns of superposed gratings in alignment of nanolithography［J］. Opt. Express, 2008, 16(11): 7869～7880

[3] [3] Zhu Jiangping, Hu Song, Yu Junsheng et al.. Theoretical analysis of photolithography alignment and the calibration method based on Moiré fringes［J］. Acta Optica Sinica, 2012, 32(6): 0607001

[4] [4] M. C. King, D. H. Berry. Photolithographic mask alignment using moiré techniques［J］. Appl. Opt., 1972, 11(6): 2455～2458

[5] [5] Y. Uchida, S. Hattori, T. Nomura. An automatic mask alignment technique using moiré interference［J］. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structure, 1987, 5(1):244～247

[6] [6] Zhang Zhiling, Sun Jie, Jin Hui. Dip angle measurement based on grating diffraction［J］. Journal of Tianjin University of Technology, 2008, 24(2): 67～68

[7] [7] Tao Wei, Pu Zhaobang, Sun Yunbin. The development of angle measurement technique［J］. Laser Journal, 2002, 23(2): 5～7

[8] [8] Isaac Amidror, Roger D. Hersch. Fourier-based analysis of phase shifts in the superposition of periodic layers and their moiré effects［J］. J. Opt. Soc. Am. A, 1996, 13(5): 974～987

[9] [9] M. Taketa, H. Ina, S. Kobayashi. Fourier-transform method of fringe-pattern analysis for computer-based topography and interferometry［J］. Opt. Soc. Am., 1982, 72(1): 156～160