Journal of Infrared and Millimeter Waves, Volume. 41, Issue 4, 726(2022)

Influence of InyAl1-yAs graded buffer layer on properties of InP-HEMT materials

Fang-Kun TIAN1,2, Li-Kun AI1、*, Guo-Yu SUN3, An-Huai XU1, Hua HUANG1, Qian GONG1, and Ming QI1
Author Affiliations
  • 1Key Laboratory of Terahertz Solid State Technology,Shanghai Institute of Microsystem and Information Technology,Chinese Academy of Sciences,Shanghai 200050,China
  • 2Center of Materials Science and Optoelectronics Engineering,University of Chinese Academy of Sciences,Beijing 100049,China
  • 3College of Physics and Electronic Engineering,Hainan Normal University,Haikou 571158,China
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    Figures & Tables(13)
    Hall mobility and electron concentrations in different channel indium contents
    HRXRD(004)ω-2θ scans for InAlAs graded buffer layer with different thickness
    The surface morphology of the InAlAs graded buffer layer with different thickness
    The surface morphology of the InGaAs channel with different InAlAs graded buffer layer thickness
    Hall mobility and electron concentrations in different InAlAs graded buffer layer thickness
    The surface morphology of the InAlAs graded buffer layer with different aluminum contents
    The surface morphology of the InGaAs channel with different aluminum contents
    TEM energy spectrum image of InP-HEMT with InAlAs graded buffer layer
    TEM Cross-sectional image of InP-HEMT with InAlAs graded buffer layer
    Hall mobility and electron concentrations in different InAlAs graded buffer layer aluminum contents
    • Table 1. InP-HEMT structure

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      Table 1. InP-HEMT structure

      LayerMaterialThickness /nm
      S.I InP Substrate
      Contact layerIn0.65Ga0.35As25
      Contact layerIn0.52Al0.48As15
      Etch stop layerInP4
      Barrier layerIn0.52Al0.48As8
      Doped layerSi concentration(2-4)×1012 cm-2
      Spacer layerIn0.52Al0.48As3
      Channel layerIn0.66Ga0.34As10
      Graded buffer layerInyAl1-yAsz(0,10,30,50,70,90)
      Buffer layerIn0.52Al0.48As500-z
    • Table 2. Properties of InAlAs graded buffer layer with different thickness

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      Table 2. Properties of InAlAs graded buffer layer with different thickness

      Thincness/nm01030507090
      FWHM/s-131.220739.7188.9168.3
      µ/cm2(vs)-18 0208 0308 2608 5708 2307 710
      Ns/1012 cm-22.7353.2423.2552.72.7563.199
      InAlAs RMS/nm0.1170.2410.3760.1540.1950.337
      InAlAs+InGaAs RMS/nm0.1850.2830.2750.170.2230.23
    • Table 3. Properties of InAlAs graded buffer layer with different aluminum contents

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      Table 3. Properties of InAlAs graded buffer layer with different aluminum contents

      Graded InAlAs

      aluminum contents/(%)

      4848→4348→3848→34

      Graded InAlAs

      indium contents/(%)

      5252→5752→6252→66
      µ/cm2(vs)-18020807085707800
      Ns/1012cm-22.7353.4852.72.987

      InAlAs

      RMS/nm

      0.1170.1970.1540.287
      InAlAs+InGaAs RMS/nm0.1850.2930.170.217
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    Fang-Kun TIAN, Li-Kun AI, Guo-Yu SUN, An-Huai XU, Hua HUANG, Qian GONG, Ming QI. Influence of InyAl1-yAs graded buffer layer on properties of InP-HEMT materials[J]. Journal of Infrared and Millimeter Waves, 2022, 41(4): 726

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    Paper Information

    Category: Research Articles

    Received: Nov. 18, 2021

    Accepted: --

    Published Online: Dec. 13, 2022

    The Author Email: Li-Kun AI (likunai@mail.sim.ac.cn)

    DOI:10.11972/j.issn.1001-9014.2022.04.011

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