Acta Optica Sinica, Volume. 24, Issue 4, 437(2004)
Study of Residual Stress in ZrO2 Thin Films
[1] [1] Boulouz M, Boulouz A, Giani A et al.. Influence of substrate temperature and target composition on the properties of yitta-stabilized thin films grown by R F. reactive magnetron sputtering. Thin Solid Films, 1998, 323:85~92
[2] [2] Gao Pengtao, Meng L G, dos Santos M P. Influence of sputtering power and the substrate-target distance on the properties of ZrO2 films prepared by RF reactive sputtering. Thin Solid Films, 2000, 377~378:557~561
[3] [3] Mehner A, Klümper-Westkamp H, Hoffman F. Crystallization and residual stress formation of sol-gel-derived zirconia films. Thin Solid Films, 1997, 308~309:363~368
[4] [4] Tamulevicius S. Stress and strain in the vacuum deposited thin films. Vacuum, 1998, 51(2):127~138
[5] [5] Thielsch R, Gatto A, Kaiser N. Mechanical stress and thermal-elastic properties of oxide coatings for use in the deep-ultraviolet spectral region. Appl. Opt., 2002, 41(16):3211~3216
Get Citation
Copy Citation Text
[in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study of Residual Stress in ZrO2 Thin Films[J]. Acta Optica Sinica, 2004, 24(4): 437