OPC with Grey Level Mask and Its Computer Simulation Study

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Acta Optica Sinica, Volume. 19, Issue 5, 698(1999)

[in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]², and [in Chinese]³

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References(4)

[1] [1] Otto O W, Garofalo J G, Yuan C M et al.. Automated optical proximity correction: A rule-based approach. Proc. SPIE, 1994, 2197:278～293

[2] [2] Inoue S. Automatic optical proximity correction with optimization of stepper condition. Proc. SPIE, 1995, 2440:240～251

[3] [3] Chen J F. Practical method for full-chip optical proximity correction. Proc. SPIE, 1997, 3051:790～803

[4] [4] Levenson M D. Extending the lifetime of optical lithography technologies with wavefront engineering. Jpn. J. Appl. Phys., 1994, 33(12B):6765～6773

CLP Journals

[1] Guo Xiaowei, Du Jinglei, Liu Yongzhi. Improving the Profiles of Imaging Patterns by Optimizing Mask in DMD-Based Maskless Photolithography[J]. Acta Optica Sinica, 2009, 29(3): 794

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. OPC with Grey Level Mask and Its Computer Simulation Study[J]. Acta Optica Sinica, 1999, 19(5): 698

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Paper Information

Category: Instrumentation, Measurement and Metrology

Received: Feb. 9, 1998

Accepted: --

Published Online: Aug. 9, 2006

The Author Email:

DOI:

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology