Fig. 1. 46.9 nm laser ablation on brass surface^[40]

Fig. 2. ZEMAX software simulation and Si surface ablation results of a 46.9 nm laser focused by a cylindrical mirror^[42]

Fig. 3. Toroidal mirror focused 46.9 nm laser ablation formed on the Si surface^[43]

Fig. 4. Ablation hole with the diameter of 82 nm obtained at 7 μm from the focal plane of FZP^[45]

Fig. 5. Schematic diagram of the wavefront splitting achieved by the Loe mirror^[46]

Fig. 6. Nanopits and nanodots based on interferometric etching^[47]. (a) Nanopits; (b) nanodots

Fig. 7. Schematic diagram of the tubular optical element^[49]

Fig. 8. Focused interference etching by 46.9 nm laser^[49]

Fig. 9. Periodic image self-healing based on Talbot effect^[50]. (a) Mask; (b) etched result

Fig. 10. Ablation rate of the three kinds of materials by 46.9 nm laser at different fluences and pulse numbers^[54]

Fig. 11. Schematic diagram of Faraday cup detection of 46.9 nm laser-induced plasma^[53]

Fig. 12. Electronic signals detected by Faraday cup^[53]

Fig. 13. Schematic representation of a Langmuir probe detecting 46.9 nm laser-induced plasma^[63]

Fig. 14. Nanoparticles generated by monolayer graphene-assisted 46.9 nm laser irradiation^[71]. (a) Cross-section depth; (b) ablation of the bare glass substrate; (c) graphene-assisted ablation of the glass substrate

Fig. 15. LIPSS formed by 46.9 nm laser in the ablated region of PMMA^[72]. (a) Two-dimensional ablation pattern; (b) three-dimensional ablation pattern

Fig. 16. LIPSS-II formed by 46.9 nm laser in the ablated region of PMMA^[73]

Fig. 17. LIPPS induced by single- and multi-shot 46.9 nm laser pulses in the BaF₂ ablation region^[74]. (a) Ablation induce by single laser pulse; (b) ablation induced by multiple pulses laser

Fig. 18. Periodic structural morphology at the boundary of the BaF₂ ablation region^[75]. (a) Ablation area; (b) edge of the ablation area

Fig. 19. Relationship between the period of micro-nano structures formed within the BaF₂ ablation region and laser energy density^[76]. (a) 230 mJ/cm²; (b) 30 mJ/cm²; (c) 15 mJ/cm²

Fig. 20. Schematic diagram of the 46.9 nm laser mass spectrometer^[79]

Fig. 21. High-resolution three-dimensional mass spectrometry imaging achieved by 46.9 nm laser mass spectrometer^[80]. (a) m/z=70.1; (b) m/z=81.1; (c) confocal microscopy image of the sample

Fig. 22. Radiation dose of 46.9 nm laser in relation to SSB and DSB yields of DNA molecules^[87]._{(a) Radiation dose in relation to SSB yield; (b) radiation dose in relation to DSB yield}

Fig. 23. 46.9 nm laser Gabor holographic device diagram and side view^[89]

Fig. 24. Schematic diagram of 46.9 nm laser Fourier transform holographic imaging device^[91]

Fig. 25. Schematic diagram of 46.9 nm laser diffraction microscope device^[92]

Fig. 26. Diffraction patterns and reconstructed images before and after correction^[92]

Fig. 27. Schematic diagram of 46.9 nm laser full-field microscope device^[93]

Fig. 28. Nano tip single shot image and oscillation in the period^[93]