Chinese Journal of Lasers, Volume. 44, Issue 9, 905002(2017)
Design of Spot Size and Optical Path in Scanning Beam Interference Lithography System
Fig. 3. Nonlinear error of interference field with different waist radii in ideal condition. (a) 0.5 mm; (b) 1.0 mm; (c) 2.0 mm; (d) 5.0 mm
Fig. 4. Nonlinear error of interference fringe with misalignment of 20 μm. (a) 0.5 mm; (b) 1.0 mm; (c) 2.0 mm; (d) 5.0 mm
Fig. 5. Nonlinear error of interference fringe with misalignment of 100 μm. (a) 0.5 mm; (b) 1.0 mm; (c) 2.0 mm; (d) 5.0 mm
Fig. 7. Variation of exposure contrast with (a) step interval and (b) waist radius of interference field at certain period error
Fig. 9. Morphologies of left and right exposure spots. (a) Left side; (b) right side
Fig. 11. Interference patterns of five-step phase shifting. (a) 0; (b) π/2; (c) π; (d) 3π/2; (e) 2π
Fig. 12. Nonlinear error distributions of interference fringe phase. (a) Two-dimensional figure; (b) three-dimensional figure
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Wang Wei, Jiang Shan, Song Ying, Bayanheshig. Design of Spot Size and Optical Path in Scanning Beam Interference Lithography System[J]. Chinese Journal of Lasers, 2017, 44(9): 905002
Category: beam transmission and control
Received: Mar. 23, 2017
Accepted: --
Published Online: Sep. 7, 2017
The Author Email: Wei Wang (wayne_lzu@163.com)