Optical design for EUV lithography source collector

Shuqing Zhang; Qi Wang; Dongyuan Zhu; Runshun Li; Chang Liu

doi:10.3788/COL201109.052201

Chinese Optics Letters, Volume. 9, Issue 5, 052201(2011)

Optical design for EUV lithography source collector

Shuqing Zhang¹, Qi Wang², Dongyuan Zhu¹, Runshun Li¹, and Chang Liu³

Author Affiliations

¹Research Center for Space Optical Engineering, Harbin Institute of Technology, Harbin 150080, China

²Institute of Opto-Electronics, Harbin Institute of Technology, Harbin 150080, China

³Center for Composite Material, Harbin Institute of Technology, Harbin 150080, China

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Cited By

[1] Wang Wen-Ting, Hu Bing, Wang Ming-Wei. Femtosecond laser fine machining of energetic materials. Acta Physica Sinica, 62, 060601(2013).

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Shuqing Zhang, Qi Wang, Dongyuan Zhu, Runshun Li, Chang Liu, "Optical design for EUV lithography source collector," Chin. Opt. Lett. 9, 052201 (2011)

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