Optical design for EUV lithography source collector

Chinese Optics Letters, Volume. 9, Issue 5, 052201(2011)

Shuqing Zhang¹, Qi Wang², Dongyuan Zhu¹, Runshun Li¹, and Chang Liu³

Author Affiliations

¹Research Center for Space Optical Engineering, Harbin Institute of Technology, Harbin 150080, China

²Institute of Opto-Electronics, Harbin Institute of Technology, Harbin 150080, China

³Center for Composite Material, Harbin Institute of Technology, Harbin 150080, China

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Shuqing Zhang, Qi Wang, Dongyuan Zhu, Runshun Li, Chang Liu, "Optical design for EUV lithography source collector," Chin. Opt. Lett. 9, 052201 (2011)

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Paper Information

Category: Optical Design and Fabrication

Received: Nov. 10, 2010

Accepted: Dec. 17, 2010

Published Online: Apr. 22, 2011

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