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Acta Optica Sinica, Volume. 42, Issue 15, 1524002(2022)

Fabrication of Nanosphere SERS Substrates Based on Mixed Electron Beam Resists

Yixuan Zhou1,2, Jing Yang3, Taoran Xu2, Zhi Qiao2, Da Mu1、*, Peipei Chen2,4、**, and Weiguo Chu2,4、***
Author Affiliations
  • 1School of Electro-Optical Engineering, Changchun University of Science and Technology, Changchun 130022, Jilin , China
  • 2Nanofabrication Laboratory, CAS Key Laboratory for Nanophotonic Materials and Devices, CAS Excellent Center for Nanoscience, National Center for Nanoscience and Technology, Beijing 100190, China
  • 3State Environmental Protection Key Laboratory of Quality Control in Environmental Monitoring, China National Environmental Monitoring Centre, Beijing 100012, China
  • 4Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
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    Figures & Tables(15)
    Fabrication of nanostructural SERS substrates by electron beam lithography based on mixed resists

    Fig. 1. Fabrication of nanostructural SERS substrates by electron beam lithography based on mixed resists

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    SEM images of SERS substrates with nanospheres for different PMMA resists mixed with HSQ and corresponding size distributions of nanospheres derived from SERS substrates. (a),(c),(e),(g) Resist nanosphere structures of P1-P4; (b),(d),(f),(h) size distributions of nanospheres of P1-P4

    Fig. 2. SEM images of SERS substrates with nanospheres for different PMMA resists mixed with HSQ and corresponding size distributions of nanospheres derived from SERS substrates. (a),(c),(e),(g) Resist nanosphere structures of P1-P4; (b),(d),(f),(h) size distributions of nanospheres of P1-P4

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    SEM image and EDS of SERS nanospheres substrates after development. (a) SEM image; (b) EDS

    Fig. 3. SEM image and EDS of SERS nanospheres substrates after development. (a) SEM image; (b) EDS

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    SEM images of SERS substrates with nanospheres after gold deposition for different PMMA resists mixed with HSQ and corresponding spacing distribution of nanospheres derived from SERS substrates. (a),(c),(e),(g) Resist nanosphere structures of P1-P4; (b),(d),(f),(h) spacing distributions of nanospheres of P1-P4

    Fig. 4. SEM images of SERS substrates with nanospheres after gold deposition for different PMMA resists mixed with HSQ and corresponding spacing distribution of nanospheres derived from SERS substrates. (a),(c),(e),(g) Resist nanosphere structures of P1-P4; (b),(d),(f),(h) spacing distributions of nanospheres of P1-P4

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    SEM image and EDS of SERS nanospheres substrates with gold deposited. (a) SEM image; (b) EDS

    Fig. 5. SEM image and EDS of SERS nanospheres substrates with gold deposited. (a) SEM image; (b) EDS

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    Raman spectra of 4-MPBA molecules with different concentrations obtained with nanostructured substrates using four PMMA resists and flat substrates. (a) P1; (b) P2; (c) P3; (d) P4

    Fig. 6. Raman spectra of 4-MPBA molecules with different concentrations obtained with nanostructured substrates using four PMMA resists and flat substrates. (a) P1; (b) P2; (c) P3; (d) P4

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    Schematic of the FDTD model. (a) Spatial model; (b) model on the xy plane

    Fig. 7. Schematic of the FDTD model. (a) Spatial model; (b) model on the xy plane

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    Local electric field enhancement based on SERS substrates. (a) P1; (b) P2; (c) P3; (d) P4

    Fig. 8. Local electric field enhancement based on SERS substrates. (a) P1; (b) P2; (c) P3; (d) P4

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    Raman intensity mapping of SERS substrates decorated with 4-MPBA

    Fig. 9. Raman intensity mapping of SERS substrates decorated with 4-MPBA

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    SERS spectra of 4-MPBA. (a) Raman spectra of 4-MPBA molecules with concentrations ranging from 1.0×10-8 mol/L to 1.0×10-5 mol/L decorated on the SERS chips, respectively; (b) calibration curves of the intensity of the peak at 1061 cm-1 versus the logarithm of 4-MPBA concentration

    Fig. 10. SERS spectra of 4-MPBA. (a) Raman spectra of 4-MPBA molecules with concentrations ranging from 1.0×10-8 mol/L to 1.0×10-5 mol/L decorated on the SERS chips, respectively; (b) calibration curves of the intensity of the peak at 1061 cm-1 versus the logarithm of 4-MPBA concentration

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    SERS spectra of R6G. (a) Raman spectra of R6G molecules with concentrations ranging from 1.0×10-8 mol/L to 1.0×10-5 mol/L decorated on the SERS chips, respectively; (b) calibration curves of the intensity of the peak at 1360 cm-1 versus the logarithm of R6G concentration

    Fig. 11. SERS spectra of R6G. (a) Raman spectra of R6G molecules with concentrations ranging from 1.0×10-8 mol/L to 1.0×10-5 mol/L decorated on the SERS chips, respectively; (b) calibration curves of the intensity of the peak at 1360 cm-1 versus the logarithm of R6G concentration

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    SERS spectra of melamine.(a) Raman spectra of melamine molecules with concentrations ranging from 1.0×10-9 mol/L to 1×10-5 mol/L decorated on the SERS chips, respectively; (b) calibration curves of the intensity of the peak at 715 cm-1 versus the logarithm of melamine concentration

    Fig. 12. SERS spectra of melamine.(a) Raman spectra of melamine molecules with concentrations ranging from 1.0×10-9 mol/L to 1×10-5 mol/L decorated on the SERS chips, respectively; (b) calibration curves of the intensity of the peak at 715 cm-1 versus the logarithm of melamine concentration

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    • Table 1. Four different types of PMMA resists and their parameters

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      Table 1. Four different types of PMMA resists and their parameters

      PMMA Resist No.Molecular weight MrSolid content /%Resist solvent
      P1950k8.0Anisole
      P2950k4.0Ethyl lactate

      P3

      P4

      PMMA/MA 33%

      495k

      3.0

      4.0

      1-methoxy-2-propanol

      Anisole

    • Table 2. Enhancement factors derived from the band at 1061 cm-1 for four SERS substrates

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      Table 2. Enhancement factors derived from the band at 1061 cm-1 for four SERS substrates

      Sample No.P1P2P3P4
      EF1.46×1065.80×1064.63×1056.16×105

    • Table 3. Theoretical enhancement factors for 4 models

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      Table 3. Theoretical enhancement factors for 4 models

      Model No.Nanosphere diameter/nmNanosphere spacing/nmAu film thickness/nmEmax /（V·m-1）EF
      P1300100517.08.35×104
      P22005556.41.12×107
      P3420500511.92.01×104
      P4400500513.23.03×104
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    Yixuan Zhou, Jing Yang, Taoran Xu, Zhi Qiao, Da Mu, Peipei Chen, Weiguo Chu. Fabrication of Nanosphere SERS Substrates Based on Mixed Electron Beam Resists[J]. Acta Optica Sinica, 2022, 42(15): 1524002

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    Paper Information

    Category: Optics at Surfaces

    Received: Jan. 27, 2022

    Accepted: Mar. 7, 2022

    Published Online: Aug. 4, 2022

    The Author Email: Mu Da (muda@cust.edu.cn), Chen Peipei (chenpp@nanoctr.cn), Chu Weiguo (wgchu@nanoctr.cn)

    DOI:10.3788/AOS202242.1524002

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology