Fabrication of Nanosphere SERS Substrates Based on Mixed Electron Beam Resists

Yixuan Zhou; Jing Yang; Taoran Xu; Zhi Qiao; Da Mu; Peipei Chen; Weiguo Chu

doi:10.3788/AOS202242.1524002

Acta Optica Sinica, Volume. 42, Issue 15, 1524002(2022)

Fabrication of Nanosphere SERS Substrates Based on Mixed Electron Beam Resists

Yixuan Zhou^1,2, Jing Yang³, Taoran Xu², Zhi Qiao², Da Mu^1、*, Peipei Chen^2,4、**, and Weiguo Chu^2,4、***

Author Affiliations

¹School of Electro-Optical Engineering, Changchun University of Science and Technology, Changchun 130022, Jilin , China

²Nanofabrication Laboratory, CAS Key Laboratory for Nanophotonic Materials and Devices, CAS Excellent Center for Nanoscience, National Center for Nanoscience and Technology, Beijing 100190, China

³State Environmental Protection Key Laboratory of Quality Control in Environmental Monitoring, China National Environmental Monitoring Centre, Beijing 100012, China

⁴Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

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Yixuan Zhou, Jing Yang, Taoran Xu, Zhi Qiao, Da Mu, Peipei Chen, Weiguo Chu. Fabrication of Nanosphere SERS Substrates Based on Mixed Electron Beam Resists[J]. Acta Optica Sinica, 2022, 42(15): 1524002

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Paper Information

Category: Optics at Surfaces

Received: Jan. 27, 2022

Accepted: Mar. 7, 2022

Published Online: Aug. 4, 2022

The Author Email: Da Mu (muda@cust.edu.cn), Peipei Chen (chenpp@nanoctr.cn), Weiguo Chu (wgchu@nanoctr.cn)

DOI:10.3788/AOS202242.1524002

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