Laser & Optoelectronics Progress, Volume. 56, Issue 3, 031601(2019)
Preparation and Characteristics of Middle and Far Infrared Stealth of Photonic Crystal Film under Intense Irradiation
Fig. 1. Spectral reflectance curves of photonic crystal at different incident angles
Fig. 8. Middle-infrared radiation temperature curves of three stealth materials measured in real time from four directions. (a) Detector is located in east or west; (b) detector is located in south or north
Fig. 9. Far-infrared radiation temperature curves of three stealth materials measured in real time from four directions. (a) Detector is located in east or west; (b) detector is located in south or north
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Ruihuang Liu, Jiaming Shi, Dapeng Zhao, Jikui Zhang, Zhiwei Liu. Preparation and Characteristics of Middle and Far Infrared Stealth of Photonic Crystal Film under Intense Irradiation[J]. Laser & Optoelectronics Progress, 2019, 56(3): 031601
Category: Materials
Received: Aug. 2, 2018
Accepted: Aug. 31, 2018
Published Online: Jul. 31, 2019
The Author Email: Jiaming Shi (sjmeei@yahoo.com.cn)