[1] [1] LEVINSON H J.Principles of Lithography[M].Bellingham Washington:SPIE Press,2001

[2] [2] HURT R,HOVE L V D.Resolution enhancement techniques in optical lithography[C].Semiconductor Fabtech,London,Henley Publishing Trans-world House,1999:241-244

[3] [3] NOGUCHI M,MURAKI M,IWASAKI Y,et al..Sub-half micron lithography system with phase shifting effect[J].SPIE,1992,1674:92-96

[4] [4] SHRIRAISHI N,HIRUKAWA S,TAKEUCHI Y,et al..New imaging technique for 64M-DRAM[J].SPIE,1992,1674:741-746

[5] [5] FINDERS J,ENGELEN A,VADENBERGHE G,et al..Experimental evaluation of Bulls-Eye illumination for assist-free random contact printing at sub-65nm node[J].SPIE,2006,6154:1-12

[6] [6] GERCHBERG R W,SAXTON W O.A practical algorithm for the determination of phase from image and diffraction plane pictures[J].Optik,1972,35(2):237-246

[7] [7] FIENUP J R.Iterative method applied to image reconstruction and to computer-generated holograms[J].Opt.Eng.,1980,19(3):297-305

[8] [8] DENG X G,LI Y P,QIU Y,et al..Phase-mixture algorithm applied to design of pure phase elements[J].Chinese J Laser,1995,B4(5):447-454

[10] [10] WANG W,LI T,LI Y P.A hybrid algorithm for the design of DOE in uniform illumination[J].Opt.Lett.,2000,181:261-265